Accurate electron affinity of V and fine-structure splittings of V− via slow-electron velocity-map imaging

Accurate electron affinity of V and fine-structure splittings of V− via slow-electron velocity-map imaging
复制标题

通过慢电子速度图成像获得 V 的精确电子亲和势和 V 的精细结构分裂

DOI:
10.1063/1.4965928
复制
发表时间:
2016-10
期刊:
The Journal of Chemical Physics
影响因子:
--
通讯作者:
Chuangang Ning
Chuangang Ning
中科院分区:
其他
文献类型:
--
作者:
Xiaoxi Fu;Zhihong Luo;Xiaolin Chen;Jiaming Li;Chuangang Ning

文献摘要

参考文献

被引文献

相似文献

摘要本文报道了用慢电子速度图成像方法获得的钒负离子的高分辨光电子能谱。V的电子亲和势为4255.9(18)cm-1或0.52766(20)eV。与以前的测量相比,准确度提高了60倍。V -分子的精细结构得到了很好的分辨:在基态5D 0上分别为35.9(11)(5D 1)、103.8(12)(5D2)、204.17(74)(5D3)和330.58(40)cm-1(5D4).
Abstract We report the high-resolution photoelectron spectra of negative vanadium ions obtained via the slow-electron velocity-map imaging method. The electron affinity of V was determined to be 4255.9(18) cm -1 or 0.527 66(20) eV. The accuracy was improved by a factor of 60 with regard to the previous measurement. The fine structure of V - was well resolved: 35.9(11) ( 5 D 1 ), 103.8(12) ( 5 D 2 ), 204.17(74) ( 5 D 3 ), and 330.58(40) cm -1 ( 5 D 4 ) above the ground state 5 D 0 , respectively.
DOI: 10.1103/physreva.85.015401
发表时间: 2012-01
期刊: Physical Review A
影响因子: 2.9
作者:
M. Vandevraye;C. Drag;C. Blondel
通讯作者: M. Vandevraye;C. Drag;C. Blondel
DOI: 10.1103/physreva.25.1265
发表时间: 1982-03
期刊: Physical Review A
影响因子: 2.9
作者:
L. Cole;J. Perdew
通讯作者: L. Cole;J. Perdew
DOI: 10.1103/physreva.89.033407
发表时间: 2014-03
期刊: Physical Review A
影响因子: 2.9
作者:
Jeremy A. Felton;M. Ray;C. Jarrold
通讯作者: Jeremy A. Felton;M. Ray;C. Jarrold
DOI: 10.1103/physreva.58.2844
发表时间: 1998-10
期刊: Physical Review A
影响因子: 2.9
作者:
M. Scheer;R. Bilodeau;C. Brodie;H. Haugen
通讯作者: M. Scheer;R. Bilodeau;C. Brodie;H. Haugen
DOI: 10.1103/physrevlett.80.2562
发表时间: 1998-03
影响因子: 8.6
作者:
M. Scheer;R. Bilodeau;H. Haugen
通讯作者: M. Scheer;R. Bilodeau;H. Haugen