Yet one more dwell time algorithm
Yet one more dwell time algorithm
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另一种停留时间算法
DOI：
10.1117/12.2270540
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发表时间：
2017
期刊：
影响因子：
--
通讯作者：
Rascher Rolf
中科院分区：
文献类型：
--
作者：
Haberl Alexander;Rascher Rolf
当前对更强大和更高效的微处理器的需求，例如深度学习，已经导致了减小集成电路的特征尺寸的持续趋势。这些处理器采用EUV光刻技术进行图案化，可实现7 nm芯片[1]。生产满足要求的反射镜是一项具有挑战性的任务。不仅对成像性能的要求越来越高，而且新的透镜形状，如非球面或具有自由曲面的透镜，都需要创新的生产工艺。然而，这些镜头需要新的确定性的子孔径抛光方法，已在过去几年中建立。这些抛光方法的特点是，通过经验确定的TIF和局部的股票去除。通过各种参数将离子束的束轮廓调整为接近理想的高斯形状。利用已知的去除函数，可以为每个测量的误差分布生成停留时间分布。这样的轮廓总是按照预定的误差轮廓精确地生成，目的总是最大限度地减少现有的表面结构，直到所用工具的截止频率[2]。校正抛光运行的处理成功决定性地取决于先前计算的停留时间轮廓的精度。因此，用于计算停留时间的算法必须准确地反映实际情况。但此外，机器操作员不应对停留时间计算产生影响。总之，不应有任何参数对计算结果产生影响。最后，它应该花费最少的加工时间，以获得最少的剩余误差结构。不幸的是，当前的停留时间算法计算是发散的、依赖于用户的，往往会产生很高的处理时间，并且需要多个参数来设置。本文描述了一种现实的、收敛的且与用户无关的停留时间算法。与现有机器中使用的传统算法（Lucy-Richardson、Van-Cittert.）相比，典型的处理时间缩短至约80%至50%。为了验证其有效性，在IBF上加工了一个平面。
The current demand of even more powerful and efficient microprocessors, for e.g. deep learning, has led to an ongoing trend of reducing the feature size of the integrated circuits. These processors are patterned with EUV-lithography which enables 7 nm chips [1]. To produce mirrors which satisfy the needed requirements is a challenging task.Not only increasing requirements on the imaging properties, but also new lens shapes, such as aspheres or lenses with free-form surfaces, require innovative production processes. However, these lenses need new deterministic sub-aperture polishing methods that have been established in the past few years. These polishing methods are characterized, by an empirically determined TIF and local stock removal.Such a deterministic polishing method is ion-beam-figuring (IBF). The beam profile of an ion beam is adjusted to a nearly ideal Gaussian shape by various parameters. With the known removal function, a dwell time profile can be generated for each measured error profile. Such a profile is always generated pixel-accurately to the predetermined error profile, with the aim always of minimizing the existing surface structures up to the cut-off frequency of the tool used [2].The processing success of a correction-polishing run depends decisively on the accuracy of the previously computed dwell-time profile. So the used algorithm to calculate the dwell time has to accurately reflect the reality. But furthermore the machine operator should have no influence on the dwell-time calculation. Conclusively there mustn’t be any parameters which have an influence on the calculation result. And lastly it should take a minimum of machining time to get a minimum of remaining error structures. Unfortunately current dwell time algorithm calculations are divergent, user-dependent, tending to create high processing times and need several parameters to bet set.This paper describes an, realistic, convergent and user independent dwell time algorithm. The typical processing times are reduced to about 80 % up to 50 % compared to conventional algorithms (Lucy-Richardson, Van-Cittert …) as used in established machines. To verify its effectiveness a plane surface was machined on an IBF.
离子束成形驻留时间算法中边缘延伸的优化
DOI：
--
发表时间：
2012
期刊：
Other Conferences
影响因子：
--
作者：
Liangxuan Shu;Fan Wu;C. Shi
通讯作者：
C. Shi
精密光学加工过程中的表面误差
DOI：
10.1117/12.2189991
发表时间：
--
期刊：
影响因子：
--
作者：
Biskup Heiko;Haberl Alexander;Rascher Rolf
通讯作者：
Rascher Rolf
从理论到实践的确定性完善
DOI：
--
发表时间：
2015
期刊：
SPIE Optifab
影响因子：
--
作者：
Abigail R. Hooper;Nathan N. Hoffmann;H. W. Sarkas;J. Escolas;Zachary Hobbs
通讯作者：
Zachary Hobbs