Structural, Electrical and Optical Properties of p-Type Transparent Conducting SnO2:Zn Film

Structural, Electrical and Optical Properties of p-Type Transparent Conducting SnO2:Zn Film
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p 型透明导电 SnO2:Zn 薄膜的结构、电学和光学性能

DOI:
10.1007/s10904-011-9619-y
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发表时间:
2011-11
影响因子:
4
通讯作者:
Zhao, Jiang
Zhao, Jiang
中科院分区:
化学3区
文献类型:
--
作者:
Ni, Jia Miao;Zhao, Xiu Jian;Zhao, Jiang

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高透明,p型导电SnO 2:Zn薄膜沉积在石英基板上的射频(RF)磁控溅射使用12重量%的ZnO掺杂88重量%的SnO 2陶瓷靶,然后在不同的温度下退火。研究了退火温度对SnO_2:Zn薄膜的结构、电学和光学性能的影响。XRD结果表明,SnO 2:Zn薄膜均为四方金红石结构,择优取向为(101)。霍尔效应结果表明,在873 K下退火3 h是p型SnO 2:Zn薄膜的最佳退火工艺参数,该薄膜具有较高的空穴浓度和较低的电阻率,分别为3.334 × 1019 cm−3和3.588 Ω cm。p型SnO 2:Zn薄膜在可见光区的平均透过率均在80%以上。此外,p型导电性也通过p型SnO 2:Zn/n型SnO 2:Sb结构的非线性特性得到证实。
Highly transparent, p-type conducting SnO2:Zn films were deposited on quartz substrates by radio frequency (RF) magnetron sputtering using a 12 wt% ZnO doped with 88 wt% SnO2 ceramic target followed by annealing at various temperatures. The effect of annealing temperature on the structural, electrical and optical performances of SnO2:Zn films has been studied. XRD results show that all the SnO2:Zn films possess tetragonal rutile structure with the preferred orientation of (101). Hall effect results indicate that at 873 K for 3 h was the optimum annealing parameters for p-type SnO2:Zn films with relatively high hole concentration and low resistivity of 3.334 × 1019 cm−3 and 3.588 Ω cm, respectively. The average transmission of the p-type SnO2:Zn films were above 80% in the visible light range. In addition, p-type conductivity was also confirmed by the non-linear characteristics of a p-type SnO2:Zn/n-type SnO2:Sb structure.
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