Dual clathrin and integrin signaling systems regulate growth factor receptor activation.
Dual clathrin and integrin signaling systems regulate growth factor receptor activation.
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DOI:
10.1038/s41467-022-28373-x
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发表时间:
2022-02-16
影响因子:
16.6
通讯作者:
Taraska JW
中科院分区:
文献类型:
--
作者:
Alfonzo-Méndez MA;Sochacki KA;Strub MP;Taraska JW
The crosstalk between growth factor and adhesion receptors is key for cell growth and migration. In pathological settings, these receptors are drivers of cancer. Yet, how growth and adhesion signals are spatially organized and integrated is poorly understood. Here we use quantitative fluorescence and electron microscopy to reveal a mechanism where flat clathrin lattices partition and activate growth factor signals via a coordinated response that involves crosstalk between epidermal growth factor receptor (EGFR) and the adhesion receptor β5-integrin. We show that ligand-activated EGFR, Grb2, Src, and β5-integrin are captured by clathrin coated-structures at the plasma membrane. Clathrin structures dramatically grow in response to EGF into large flat plaques and provide a signaling platform that link EGFR and β5-integrin through Src-mediated phosphorylation. Disrupting this EGFR/Src/β5-integrin axis prevents both clathrin plaque growth and dampens receptor signaling. Our study reveals a reciprocal regulation between clathrin lattices and two different receptor systems to coordinate and enhance signaling. These findings have broad implications for the regulation of growth factor signaling, adhesion, and endocytosis. The integration and organization of growth factor signaling, adhesion, and endocytosis is poorly understood. Here the authors use light and electron microscopy to shed light on the role of flat clathrin lattices and cell adhesion in growth factor signaling.
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DOI:
10.1083/jcb.84.3.560
发表时间:
1980-03
期刊:
The Journal of cell biology
影响因子:
--
作者:
Heuser J
通讯作者:
Heuser J
影响因子:
2.4
作者:
Buwa, Natasha;Mazumdar, Debasmita;Balasubramanian, Nagaraj
通讯作者:
Balasubramanian, Nagaraj
影响因子:
8.8
作者:
da Rocha-Azevedo B;Lee S;Dasgupta A;Vega AR;de Oliveira LR;Kim T;Kittisopikul M;Malik ZA;Jaqaman K
通讯作者:
Jaqaman K
影响因子:
16.6
作者:
Flores-Otero J;Ahn KH;Delgado-Peraza F;Mackie K;Kendall DA;Yudowski GA
通讯作者:
Yudowski GA
DOI:
10.1093/jmicro/52.6.535
发表时间:
2003-01-01
期刊:
JOURNAL OF ELECTRON MICROSCOPY
影响因子:
--
作者:
Akisaka, T;Yoshida, H;Takama, KE
通讯作者:
Takama, KE