Corrosion of tungsten microelectrodes used in neural recording applications.
Corrosion of tungsten microelectrodes used in neural recording applications.
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神经记录应用中使用的钨微电极的腐蚀。
DOI：
10.1016/j.jneumeth.2011.03.012
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发表时间：
2011-06-15
影响因子：
3
通讯作者：
Nishida, Toshikazu
中科院分区：
文献类型：
--
作者：
Patrick, Erin;Orazem, Mark E.;Sanchez, Justin C.;Nishida, Toshikazu
在神经假体应用中，电极的长期生存能力对于可靠记录用于生成通信和控制信号的神经群体的活动是必要的。在受控台式研究中分析了用于皮质内记录应用的钨微丝电极的腐蚀，并与体内研究中使用的钨微丝的腐蚀进行了比较。研究了两种电解质用于台式电化学分析：0.9% 磷酸盐缓冲盐水 (PBS) 和含有 30 mM 过氧化氢的 0.9% PBS。通过测量开路电位和分析普贝图发现了导致腐蚀的氧化和还原反应。发现钨溶解形成钨离子是腐蚀机制。腐蚀速率是根据极化电阻来估计的，极化电阻是从电化学阻抗谱数据推断出来的。结果表明，钨微丝在 PBS 电解质中的腐蚀率为 300–700 µm/年。钨微丝在含有 PBS 和 30 mM H2O2 的电解液中的腐蚀速率加速至 10,000–20,000 µm/年。研究发现腐蚀速率由阴极反应中反应物质（例如 O2 和 H2O2）的浓度控制。植入期间的平均体内腐蚀速率估计为 100 µm/年。与台式腐蚀速率相比，体内腐蚀速率降低是由于生物膜的存在导致氧扩散速率降低以及大脑中可用氧浓度降低。
In neuroprosthetic applications, long-term electrode viability is necessary for robust recording of the activity of neural populations used for generating communication and control signals. The corrosion of tungsten microwire electrodes used for intracortical recording applications was analyzed in a controlled bench-top study and compared to the corrosion of tungsten microwires used in an in vivo study. Two electrolytes were investigated for the benchtop electrochemical analysis: 0.9% phosphate buffered saline (PBS) and 0.9% PBS containing 30 mM of hydrogen peroxide. The oxidation and reduction reactions responsible for corrosion were found by measurement of the open circuit potential and analysis of Pourbaix diagrams. Dissolution of tungsten to form the tungstic ion was found to be the corrosion mechanism. The corrosion rate was estimated from the polarization resistance, which was extrapolated from the electrochemical impedance spectroscopy data. The results show that tungsten microwires in an electrolyte of PBS have a corrosion rate of 300–700 µm/yr. The corrosion rate for tungsten microwires in an electrolyte containing PBS and 30 mM H2O2 is accelerated to 10,000–20,000 µm/yr. The corrosion rate was found to be controlled by the concentration of the reacting species in the cathodic reaction (e.g. O2 and H2O2). The in vivo corrosion rate, averaged over the duration of implantation, was estimated to be 100 µm/yr. The reduced in vivo corrosion rate as compared to the benchtop rate is attributed to decreased rate of oxygen diffusion caused by the presence of a biological film and a reduced concentration of available oxygen in the brain.
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