Crystallographic Orientation Dependence of Nanopattern Morphology and Size in Electropolished Polycrystalline and Monocrystalline Aluminum: An EBSD and SEM Study
Crystallographic Orientation Dependence of Nanopattern Morphology and Size in Electropolished Polycrystalline and Monocrystalline Aluminum: An EBSD and SEM Study
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电解抛光多晶和单晶铝中纳米图案形态和尺寸的晶体取向依赖性:EBSD 和 SEM 研究
DOI:
10.1149/1945-7111/aba6c7
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发表时间:
2020-07
影响因子:
3.9
通讯作者:
Yang Gan
中科院分区:
文献类型:
--
作者:
Yuan;Dan Zhang;Feihu Zhang;Chunhui Yang;Yang Gan
Electropolishing of aluminum (Al) has been applied to form surface nanopatterns of various morphologies and sizes. However, the effect of crystallographic orientation on nanopattern morphology and size in electropolished Al is unclear. Here, annealed polycrystalline and monocrystalline Al samples were electropolished at 40 V in an electrolyte of perchloric acid, ethanol, butyl cellusolve and water, the correlation between crystallographic orientation and nanopattern morphology and size was firmly established through systematic EBSD and SEM examination. Heterogeneity in nanopattern morphology and nanopattern size is induced by crystallographic anisotropy of grains. Nanopattern morphology and size change gradually for grains and planes oriented with varying misorientation angles against each primary direction [101]//ND,[101]//ND and [111]//ND. The transitions between nanopattern morphologies also occur for grain surface planes with near identical misorientation angles. The surface structure sensitivity of nanopattern morphology and size was firmly established and then qualitatively explained by invoking step-terrace and step-ledge surface structure models and by developing a refined adsorption-diffusion perspective based on a reported theoretical model. The findings reported here contribute significantly to gaining new insights into the crystallographic orientation dependence of nanopattern morphology and nanopattern size in electropolished Al and other metals.
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影响因子:
1.6
作者:
Yue Wang;Sherdeep Singh;P. Kruse
通讯作者:
Yue Wang;Sherdeep Singh;P. Kruse
影响因子:
1.8
作者:
Supriyo Bandyopadhyay
通讯作者:
Supriyo Bandyopadhyay
DOI:
10.1088/0022-3735/3/1/419
发表时间:
1969
期刊:
Journal of Physics E: Scientific Instruments
影响因子:
--
作者:
K. Nakajima;T. Ishiguro;T. Chiku
通讯作者:
K. Nakajima;T. Ishiguro;T. Chiku
影响因子:
3.7
作者:
V. Yuzhakov;Hsueh-Chia Chang;A. Miller
通讯作者:
V. Yuzhakov;Hsueh-Chia Chang;A. Miller
影响因子:
2.8
作者:
Yang, G.;Wang, B.;Chen, G.
通讯作者:
Chen, G.