The Effect of Fine Channel & Collisional Mixing on Mist CVD Method
The Effect of Fine Channel & Collisional Mixing on Mist CVD Method
复制标题
精细通道的效果
DOI：
10.2472/jsms.57.481
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发表时间：
2008
期刊：
影响因子：
--
通讯作者：
S. Fujita
中科院分区：
文献类型：
--
作者：
T. Kawaharamura;H. Nishinaka;S. Fujita
雾状CVD法，以前称为雾状沉积或喷雾热解，是一种环境友好且具有成本效益的薄氧化物膜沉积技术。雾状CVD法的特征在于将构成元素的液体溶液作为源材料，将其雾化以形成气溶胶颗粒的雾。然后通过载气将雾转移到反应区域以沉积薄膜。这不需要真空系统，因为它在大气条件下操作。选择了各种材料溶液作为源，包括无毒和无害的材料溶液。因此，该方法具有安全、经济、对环境负荷小、对人体无害、适用范围广等优点，为了在大面积基片上获得更光滑的薄膜，必须保证雾流和载气的均匀流动。我们开发了两种新方法。其中之一是细通道雾化学气相沉积（FCM-CVD）方法，该方法具有细通道和碰撞混合，以获得均匀的雾和载气流动。另一种称为线性源雾（LSM-）CVD法，是一种专门用于连续过程的技术。采用FCM-CVD方法在100 mm正方形玻璃衬底上成功制备了ZnO薄膜，在40 mm ~ 2处的偏差率为±0.45%。本文从理论、模拟和实验等方面研究了“细通道”和“碰撞混合”对雾状CVD法的影响。
The mist CVD method, previously named as mist deposition or spray pyrolysis, is an environmental friendly and cost-effective technology for the deposition of thin oxide films. The mist CVD method features the liquid solution of constituent elements as source materials, which is atomized to form the mist of aerosol particles. The mists are then transferred by a carrier gas to the reaction area to the deposition of thin films. This does not need vacuum systems because it is operated at atmospheric conditions. Furthermore various material solutions are chosen for the source, including innocuous and nonpoisonous ones. Therefore, this method possesses advantages of safety, cost-effective, light load to the environment, harmless to the human, and multiplicity of applying to a lot of materials.In order to make smoother films on large substrates in this technology, it is important to obtain the uniform flow of mists and carrier gas. We have developed two kind of new methods. One of them is named as fine channel mist chemical vapor deposition (FCM-CVD) method which has a fine channel and collisional mixing to obtain uniform flow of mists and carrier gas. The other is named as linear source mist (LSM-) CVD method which is a technique for specializing in a continuous process. With using FCM-CVD, we fabricated ZnO thin films and succeed to obtain the homogeneous thin films on the 100mm square glass substrate whose deviation rate was ±0.45% at 40mm2.In this study, we report the effect of “fine channel” and “collisional mixing” on mist CVD method from view points of theorem, simulation, experience, and so on.
影响因子：
4
作者：
H. Hojo;K. Fujita;Katsuhisa Tanaka;K. Hirao
通讯作者：
H. Hojo;K. Fujita;Katsuhisa Tanaka;K. Hirao
影响因子：
1.8
作者：
Lu, J. G.;Kawaharamura, T.;Fujita, S.
通讯作者：
Fujita, S.