Microscope projection photolithography of polymeric optical micro- and nanocomponents
Microscope projection photolithography of polymeric optical micro- and nanocomponents
复制标题
聚合物光学微米和纳米元件的显微镜投影光刻
DOI:
10.1117/12.2546679
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发表时间:
2020
期刊:
影响因子:
--
通讯作者:
B. Roth
中科院分区:
文献类型:
--
作者:
L. Zheng;C. Reinhardt;B. Roth
Lithography is one of the key technologies employed for the fabrication of optical devices and components, which could be applied in fields as diverse as optical sensing, communication and information technologies. Microscope projection photolithography (MPP), as a low-cost, simple and flexible lithography method, lends itself for versatile applications. Its feasibility in realizing various microstructures has been verified already. However, the improvement of the quality and resolution of structures still remains challenging. Here, we present an MPP method for the controlled generation of high-quality and high-resolution 2D optical micro- and nanostructures. Particularly, an improved process chain, which significantly shortens the time from structure design to the realization to less than one day, is introduced. The structures, first designed with vector-graphics software, are printed on a commercial transparency film. Then, the film is placed into a self-developed setup, and the structure patterns are transferred onto a chromium photomask with a demagnification of 10:1, for example. The last step is to place the chromium photomask into the MPP arrangement and implement the fabrication using a microscope objective to demagnify and project structure patterns onto photoresist which is simultaneously exposed to UV light. With this process chain, periodic structures with a minimum feature size of 150 nm were realized using an objective with NA of 1.4. Furthermore, various photonic components such as micro ring resonators and arrayed waveguide gratings with high quality were generated with application potential, e. g. in sensing and monitoring.
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DOI:
--
发表时间:
1983
期刊:
影响因子:
--
作者:
M. Brady;A. Davidson
通讯作者:
A. Davidson
DOI:
--
发表时间:
2015
期刊:
Sensing Technologies + Applications
影响因子:
--
作者:
E. Pichler;Konrad Bethmann;U. Zywietz;Christian Spad;U. Gleißner;Christian Kelb;B. Roth;C. Reinhardt;U. Willer;W. Schade
通讯作者:
W. Schade
影响因子:
3.8
作者:
Rahlves, Maik;Rezem, Maher;Roth, Bernhard
通讯作者:
Roth, Bernhard
影响因子:
3.6
作者:
Orghici;Bethmann;Zywietz;Reinhardt;Schade
通讯作者:
Schade
影响因子:
3.8
作者:
Birr, Tobias;Zywietz, Urs;Reinhardt, Carsten
通讯作者:
Reinhardt, Carsten