Microscope projection photolithography of polymeric optical micro- and nanocomponents

Microscope projection photolithography of polymeric optical micro- and nanocomponents
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聚合物光学微米和纳米元件的显微镜投影光刻

DOI:
10.1117/12.2546679
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发表时间:
2020
期刊:
影响因子:
--
通讯作者:
B. Roth
B. Roth
中科院分区:
--
文献类型:
--
作者:
L. Zheng;C. Reinhardt;B. Roth

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光刻技术是制造光学器件的关键技术之一,可应用于光学传感、通信和信息技术等领域。显微投影光刻(MPP)是一种低成本、简单、灵活的光刻方法,具有广泛的应用前景。其实现各种微结构的可行性已经得到验证。然而,提高结构的质量和分辨率仍然具有挑战性。在这里,我们提出了一种MPP方法,用于控制生成高质量和高分辨率的2D光学微米和纳米结构。特别是,一个改进的过程链,这显着缩短了从结构设计到实现的时间不到一天,介绍。这些结构首先用矢量图形软件设计,然后印在商业透明胶片上。然后,将膜置于自显影装置中,并且将结构图案转移到例如缩小率为10:1的铬光掩模上。最后一步是将铬光掩模放入MPP装置中,并使用显微镜物镜将结构图案缩小并投影到同时暴露于UV光的光致抗蚀剂上来实现制造。通过该工艺链,使用NA为1.4的物镜实现了最小特征尺寸为150 nm的周期性结构。此外,各种高质量的光子器件如微环谐振器、阵列波导光栅等也被研制出来,具有很大的应用潜力。G.在传感和监测方面。
Lithography is one of the key technologies employed for the fabrication of optical devices and components, which could be applied in fields as diverse as optical sensing, communication and information technologies. Microscope projection photolithography (MPP), as a low-cost, simple and flexible lithography method, lends itself for versatile applications. Its feasibility in realizing various microstructures has been verified already. However, the improvement of the quality and resolution of structures still remains challenging. Here, we present an MPP method for the controlled generation of high-quality and high-resolution 2D optical micro- and nanostructures. Particularly, an improved process chain, which significantly shortens the time from structure design to the realization to less than one day, is introduced. The structures, first designed with vector-graphics software, are printed on a commercial transparency film. Then, the film is placed into a self-developed setup, and the structure patterns are transferred onto a chromium photomask with a demagnification of 10:1, for example. The last step is to place the chromium photomask into the MPP arrangement and implement the fabrication using a microscope objective to demagnify and project structure patterns onto photoresist which is simultaneously exposed to UV light. With this process chain, periodic structures with a minimum feature size of 150 nm were realized using an objective with NA of 1.4. Furthermore, various photonic components such as micro ring resonators and arrayed waveguide gratings with high quality were generated with application potential, e. g. in sensing and monitoring.
DOI: --
发表时间: 1983
期刊:
影响因子: --
作者:
M. Brady;A. Davidson
通讯作者: A. Davidson
用于感测气体物质的聚合物箔环形谐振器
DOI: --
发表时间: 2015
期刊: Sensing Technologies + Applications
影响因子: --
作者:
E. Pichler;Konrad Bethmann;U. Zywietz;Christian Spad;U. Gleißner;Christian Kelb;B. Roth;C. Reinhardt;U. Willer;W. Schade
通讯作者: W. Schade
DOI: 10.1364/oe.23.003614
发表时间: 2015-02-09
期刊: OPTICS EXPRESS
影响因子: 3.8
作者:
Rahlves, Maik;Rezem, Maher;Roth, Bernhard
通讯作者: Roth, Bernhard
850nm 处的全聚合物阵列波导光栅:设计、制造和表征
DOI: 10.1364/ol.41.003940
发表时间: 2016
期刊: Optics letters
影响因子: 3.6
作者:
Orghici;Bethmann;Zywietz;Reinhardt;Schade
通讯作者: Schade
DOI: 10.1364/oe.23.031755
发表时间: 2015-12-14
期刊: OPTICS EXPRESS
影响因子: 3.8
作者:
Birr, Tobias;Zywietz, Urs;Reinhardt, Carsten
通讯作者: Reinhardt, Carsten