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The Growth of Visible Wavelength Quaternary Semiconductors by Metalorganic Chemical Vapor Deposition (Electrical Engineering)

The Growth of Visible Wavelength Quaternary Semiconductors by Metalorganic Chemical Vapor Deposition (Electrical Engineering)
通过金属有机化学气相沉积生长可见波长四元半导体(电气工程)
批准号:
8406281
负责人:
James Coleman
金额:
$5.39万
依托单位国家:
美国
项目类别:
Continuing Grant
财政年份:
1985
资助国家:
美国
项目状态:
已结题
起止时间:
1985-07-01 至 1987-06-30

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中文摘要
翻译
可见光波长III-V半导体二极管激光器引起了人们的极大兴趣。研究内容包括金属有机化学气相沉积(MOCVD)生长III-V合金InGaPAs和InGaAlP以及利用这些材料研制可见光激光二极管。该项目包括三个步骤:In-和P-化合物MOCVD生长工艺的开发,在常见的GaAs衬底上生长的常规双异质结激光器的开发,以及量子阱异质结的初步开发。
英文摘要
There is a great deal of interest in visible wavelength III-V semiconductor diode lasers. The research involves study of the growth of the III-V alloys InGaPAs and InGaA1P by metalorganic chemical vapor deposition (MOCVD) and the development of visible laser diodes from these materials. This program involves three steps: development of the MOCVD growth process for In- and P-compounds, development of conventional double heterostructures lasers grown on commonly available GaAs substrate, and initial development of quantum well heterostructures.
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