Workshop: Engineering Research Needs for Electronic Materials Processing; to be held in Newark, Delaware June 24-25, 1985

研讨会：电子材料加工的工程研究需求；

• 批准号: 8505951
• 负责人: Scott Jackson
• 金额: $ 3.01万
• 依托单位: University of Delaware
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 1985
• 资助国家: 美国
• 起止时间: 1985-03-15 至 1986-02-28
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=8505951&HistoricalAwards=false
• 关键词: Workshop; Engineering; Research; Needs; Electronic

Support will be provided to the workshop on 'Engineering Research Needs for Electronic Materials Processing.' Its objective is to identify the long-range engineering research needs and opportunities in electronic materials processing. The workshop will create an awareness in the academic research community as to where research can be applied in new and emerging technologies and to assist NSF management in the possible focus of future planning and assessment efforts in this area of fundamental research. Invited participants will evaluate the present understanding and capabilities of: thin-film formation, including simple evaporation and molecular beam epitoxy; chemical deposition, including vapor and liquid phases; innovative deposition processes; plasma processing for both etching and deposition; and integration as it relates to the interactions among consecutive and non-consecutive unit operations. Top experts in electronic chemical and materials processing will be invited to attend the workshop.

将为“电子材料处理的工程研究需求”的研讨会提供支持。 它的目标是确定电子材料处理中的远程工程研究需求和机会。 该研讨会将在学术研究界提高人们的意识，以了解可以在新的和新兴的技术中应用研究，并协助NSF管理，从而将未来的计划和评估工作重点放在这一基础研究领域。 受邀参与者将评估当前的理解和能力：薄膜形成，包括简单的蒸发和分子束的表现；化学沉积，包括蒸气和液相；创新的沉积过程； 蚀刻和沉积的血浆处理；与连续和非连续单元操作之间的相互作用有关的集成。 电子化学和材料加工方面的高级专家将被邀请参加研讨会。