Workshop: Engineering Research Needs for Electronic Materials Processing; to be held in Newark, Delaware June 24-25, 1985

将为“电子材料加工的工程研究需求”研讨会提供支持。 其目标是确定电子材料加工中的长期工程研究需求和机会。 该研讨会将提高学术研究界对研究可以应用于新兴技术的认识，并协助 NSF 管理层确定这一基础研究领域未来规划和评估工作的可能重点。 受邀参加者将评估目前对以下方面的理解和能力： 薄膜形成，包括简单蒸发和分子束外延；化学沉积，包括气相和液相；创新的沉积工艺； 用于蚀刻和沉积的等离子处理；和集成，因为它涉及连续和非连续单元操作之间的相互作用。 研讨会将邀请电子化学和材料加工领域的顶尖专家参加。

Support will be provided to the workshop on 'Engineering Research Needs for Electronic Materials Processing.' Its objective is to identify the long-range engineering research needs and opportunities in electronic materials processing. The workshop will create an awareness in the academic research community as to where research can be applied in new and emerging technologies and to assist NSF management in the possible focus of future planning and assessment efforts in this area of fundamental research. Invited participants will evaluate the present understanding and capabilities of: thin-film formation, including simple evaporation and molecular beam epitoxy; chemical deposition, including vapor and liquid phases; innovative deposition processes; plasma processing for both etching and deposition; and integration as it relates to the interactions among consecutive and non-consecutive unit operations. Top experts in electronic chemical and materials processing will be invited to attend the workshop.