Industry/University Cooperative Research: Collisional and Optical Phenomena in Plasmas Used in Microelectronic Processes

这项研究涉及一个合作的理论和实验 与微电子加工相关的研究。 结果 预计将有重大应用的一个重要领域， 技术和促进有关基本 等离子体环境中的原子和分子过程。 广泛 等离子体在电子器件的干法处理中的使用已经更新 对低压、低温的化学和物理感兴趣 辉光放电 各向异性蚀刻可以通过以下各项的协同作用来实现： 离子和中性多相化学。 至关重要的是 研究等离子体电场和碰撞现象 其支配离子传输的各向异性并影响 等离子体表面化学

This research involves a collaborative theoretical and experimental study relevant to microelectronics processing. The results are expected to have significant applications to an important area of technology and to contribute to basic knowledge about fundamental atomic and molecular processes in a plasma environment. The widespread use of plasmas in the dry processing of electronic devices has renewed interest in the chemistry and physics of low pressure, low temperature glow discharges. Anistropic etching can be achieved by a synergism of ion and neutral heterogeneous chemistry. It is of crucial importance to investigate the plasma electric fields and collisional phenomena which govern the anistropy of ion transport and influence the plasma-surface chemistry.