Laser Produced Plasma Soft X-Ray Lithography and Microscopy

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High peak power laser radiation focused onto a solid target can generate soft x-rays from the laser-produced plasma with high conversion efficiency. These x-ray sources are an attractive laboratory-scale alternative to synchrotron radiation sources, stationary anodes, and pinch plasmas for the 0.3keV to 1KeV region. The goal of this research program is to investigate the laser-produced plasma as a source for x-ray lithography and microscopy. The Stanford group estimates that with 200 watts average power from their compact solid-state slab laser which is currently under development in this project, they should generate sufficient soft-x-ray radiation for production-level integrated circuit wafer exposure. They also seek to demonstrate that the plasma source will allow soft x-ray microscopy with resolution below 1000 Angstroms.