Microwave Plasma Generation and Applications

微波等离子体的产生和应用

• 批准号: 8612912
• 负责人: Ward Getty
• 金额: $ 24万
• 依托单位: Regents of the University of Michigan - Ann Arbor
• 依托单位国家: 美国
• 项目类别: Continuing Grant
• 财政年份: 1987
• 资助国家: 美国
• 起止时间: 1987-02-01 至 1991-01-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=8612912&HistoricalAwards=false
• 关键词: Microwave; Plasma; Generation; Applications

This research program is on microwave production of a hot plasma in a magnetic-mirror trap, and the application of this plasma as an x-ray or ion source. The areas of application to be studied are x-ray lithography in solid-state circuit production and multiply-charged ion production for ion beams. The plasma is produced and heated by electron cyclotron resonance heating. The generation of a non- Maxwellian electron velocity distribution by cyclotron heating will be studied experimentally and by computer simulation. Electron cyclotron emission will be used as a diagnostic. The average energy and flux of x-ray radiation from the plasma will be evaluated for lithography applications. The confinement properties and behavior of the plasma in a minimum-B magnetic field will be correlated with its performance as an ion source.

本研究项目是在磁镜阱中微波产生热等离子体，并将该等离子体用作x射线或离子源。要研究的应用领域是固态电路生产中的x射线光刻和离子束的多电荷离子生产。等离子体通过电子回旋共振加热产生和加热。通过实验和计算机模拟，对回旋加速器加热产生非麦克斯韦电子速度分布进行了研究。电子回旋辐射将被用作诊断。等离子体x射线辐射的平均能量和通量将用于光刻应用。等离子体在最小b磁场中的约束特性和行为将与其作为离子源的性能相关。