An Integrated Training Programme To Realise The Next Generation Of Plasma-assisted Manufacturing Professionals, Researchers And Technicians For The UK
旨在培养英国下一代等离子辅助制造专业人员、研究人员和技术人员的综合培训计划
基本信息
- 批准号:10074799
- 负责人:
- 金额:$ 32.13万
- 依托单位:
- 依托单位国家:英国
- 项目类别:Collaborative R&D
- 财政年份:2023
- 资助国家:英国
- 起止时间:2023 至 无数据
- 项目状态:未结题
- 来源:
- 关键词:
项目摘要
Semiconductor technology has become a critical driver of economic growth and innovation, with its applications spanning various industries, such as electronics, automotive, aerospace, and medical technology. Plasma science plays a pivotal role in semiconductor manufacturing, enabling advanced processes such as etching and deposition, which are essential for producing state-of-the-art electronic devices. However, despite the urgent need for skilled plasma scientists to support the UK's growing semiconductor industry, there is currently no cohesive national training programme in plasma science for semiconductor processing.To address this pressing need, this award will:1. Develop a comprehensive, industry-driven curriculum: The centre will offer a tailored, hands-on curriculum that covers the theoretical foundations of plasma science, as well as its practical applications in semiconductor manufacturing.2. Train the next generation of plasma scientists: Over an 18-month period, the centre will train 20 scientists, equipping them with the knowledge and skills required to excel in plasma science for semiconductor processing.3. Foster collaboration and innovation: By bringing together trainees, academics, and industry professionals, the centre will create a dynamic environment that fosters collaboration and innovation. This interdisciplinary approach will not only facilitate the exchange of ideas and expertise but also inspire trainees to develop novel solutions to the challenges faced by the semiconductor industry.4. Establish a sustainable pipeline of skilled workers: The centre will create an opportunity for undergraduate and postgraduate students to gain hands-on experience of plasma processing equipment, giving them the skills for a future career in the UK semiconductor industry.5. Engage with the wider community: In addition to training plasma scientists, the centre will also engage with schools, colleges, and local communities to raise awareness about the importance of plasma science in semiconductor manufacturing and to inspire the next generation of scientists and engineers.The proposed training centre therefore represents a significant investment in the future of the UK's semiconductor industry. By providing world-class training in plasma science for semiconductor processing, the centre will not only help to bridge the existing skills gap but also contribute to the long-term competitiveness and innovation of the sector. We believe that this centre will be a valuable asset to the UK, enabling us to remain at the forefront of technological advancements and maintain our position as a global leader in the semiconductor industry.
半导体技术已成为经济增长和创新的关键驱动力,其应用涵盖电子、汽车、航空航天和医疗技术等各个行业。等离子体科学在半导体制造中发挥着关键作用,可以实现蚀刻和沉积等先进工艺,这些工艺对于生产最先进的电子设备至关重要。然而,尽管迫切需要熟练的等离子体科学家来支持英国不断发展的半导体产业,但目前还没有针对半导体加工的等离子体科学的全国性培训计划。开发全面的行业驱动课程:该中心将提供量身定制的实践课程,涵盖等离子体科学的理论基础及其在半导体制造中的实际应用。2.培养下一代等离子体科学家:在18个月的时间里,该中心将培训20名科学家,使他们具备在半导体加工等离子体科学方面出类拔萃所需的知识和技能。促进合作和创新:通过汇集学员,学者和行业专业人士,该中心将创造一个充满活力的环境,促进合作和创新。这种跨学科的方法不仅将促进思想和专业知识的交流,还将激励学员开发新的解决方案,以应对半导体行业面临的挑战。建立一个可持续的技术工人管道:该中心将为本科生和研究生创造一个获得等离子体加工设备实践经验的机会,为他们未来在英国半导体行业的职业生涯提供技能。与更广泛的社区合作:除了培训等离子科学家,该中心还将与学校、大学和当地社区合作,提高人们对等离子科学在半导体制造中的重要性的认识,并激励下一代科学家和工程师。因此,拟议的培训中心代表着对英国半导体行业未来的重大投资。通过提供世界一流的半导体加工等离子体科学培训,该中心不仅有助于弥合现有的技能差距,还有助于该行业的长期竞争力和创新。我们相信,该中心将成为英国的宝贵资产,使我们能够保持在技术进步的最前沿,并保持我们作为半导体行业全球领导者的地位。
项目成果
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其他文献
吉治仁志 他: "トランスジェニックマウスによるTIMP-1の線維化促進機序"最新医学. 55. 1781-1787 (2000)
Hitoshi Yoshiji 等:“转基因小鼠中 TIMP-1 的促纤维化机制”现代医学 55. 1781-1787 (2000)。
- DOI:
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LiDAR Implementations for Autonomous Vehicle Applications
- DOI:
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2021 - 期刊:
- 影响因子:0
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吉治仁志 他: "イラスト医学&サイエンスシリーズ血管の分子医学"羊土社(渋谷正史編). 125 (2000)
Hitoshi Yoshiji 等人:“血管医学与科学系列分子医学图解”Yodosha(涉谷正志编辑)125(2000)。
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Effect of manidipine hydrochloride,a calcium antagonist,on isoproterenol-induced left ventricular hypertrophy: "Yoshiyama,M.,Takeuchi,K.,Kim,S.,Hanatani,A.,Omura,T.,Toda,I.,Akioka,K.,Teragaki,M.,Iwao,H.and Yoshikawa,J." Jpn Circ J. 62(1). 47-52 (1998)
钙拮抗剂盐酸马尼地平对异丙肾上腺素引起的左心室肥厚的影响:“Yoshiyama,M.,Takeuchi,K.,Kim,S.,Hanatani,A.,Omura,T.,Toda,I.,Akioka,
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