Sputtering System (Materials Research)

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A multisource sputtering system with in-situ characterization capabilities useful for the preparation of thin films and superlattices will be acquired. Some of the problems to be studied with this apparatus are; basic processes important in thin films growth including the study of the effect of growth parameters on the structure and physical properties of thin films and superlattices; effects of controlled roughness on the structure of thin films and superlattices; a variety of superconducting problems, including dimensional studies and development of ultrahigh critical field materials; magnetism, especially studies related to magnetic anisotropy, DC magnetization and ferromagnetic resonance; transport properties both in the perpendicular and parallel direction and development and study of the optical properties of multilayers in the soft x-ray range. This type of an instrument is a must for any of the studies here. The principal investigator is well known for his research in the preparation of thin films and multilayered materials while at Argonne National Laboratory