Sputtering System (Materials Research)

将获得一个具有原位表征能力的多源溅射系统，用于制备薄膜和超晶格。用这种仪器研究的一些问题是；薄膜生长中重要的基本过程，包括生长参数对薄膜和超晶格结构和物理性质的影响的研究；可控粗糙度对薄膜和超晶格结构的影响各种超导问题，包括尺寸研究和超高临界场材料的开发；磁学，特别是与磁各向异性、直流磁化和铁磁共振有关的研究；垂直与平行方向的输运性质及多层膜在软x射线范围内光学性质的发展与研究。这种类型的仪器是必须的任何研究在这里。在阿贡国家实验室期间，首席研究员因其在薄膜和多层材料制备方面的研究而闻名

A multisource sputtering system with in-situ characterization capabilities useful for the preparation of thin films and superlattices will be acquired. Some of the problems to be studied with this apparatus are; basic processes important in thin films growth including the study of the effect of growth parameters on the structure and physical properties of thin films and superlattices; effects of controlled roughness on the structure of thin films and superlattices; a variety of superconducting problems, including dimensional studies and development of ultrahigh critical field materials; magnetism, especially studies related to magnetic anisotropy, DC magnetization and ferromagnetic resonance; transport properties both in the perpendicular and parallel direction and development and study of the optical properties of multilayers in the soft x-ray range. This type of an instrument is a must for any of the studies here. The principal investigator is well known for his research in the preparation of thin films and multilayered materials while at Argonne National Laboratory