U.S.-Brazil Cooperative Research on: Collision Cross Sections and Spectroscopic Properties of Silicon Containing Molecules

该奖项支持加州理工学院喷气推进实验室的S.K.Sriastava与里约热内卢联邦大学(UFRJ)的G.G.B.de Souza和A.C.A.de Souza以及Ione IGA之间关于分子碰撞截面的合作研究，李·穆陶和何塞·卡洛斯·诺盖拉在巴西圣卡洛斯联邦大学。斯利瓦斯塔瓦自1981年以来一直与这两个组织合作。拟议的工作将在所有三个机构进行，喷气推进实验室的巴西人和巴西的美国人将参与其中。含硅分子的电离、解离和极性解离截面的测量将在喷气推进实验室进行。在UFRJ，内壳激发的光吸收截面将被测量，而解离产物(带电离子)的动能谱将在UFSC被测量。这项工作对于半导体加工中使用的硅烷的等离子体化学来说尤其及时。进展应该很快，因为设备已经安装好并在运行中。每个参与机构都有实验工作的基本部分，因此合作对研究至关重要，显然对三方都是互惠互利的。

This award supports cooperative research on molecular collision cross-sections between S. K. Srivastava of the Jet Propulsion Laboratory, Caltech and G.G.B. de Souza and A.C.A. de Souza at the Universidade Federal do Rio de Janeiro (UFRJ) and Ione Iga, Lee Mu Tao and Jose Carlos Nogueira at the Universidade Federal do Sao Carlos (UFSC) in Brazil. Srivastava has collaborated with the two groups since 1981. The work proposed will be carried out at all three institutions with the participation of the Brazilians at JPL and the U.S. side in Brazil. Measurements of the cross-sections for molecules containing silicon for ionization, dissociative attachment and polar dissociation will be carried out at JPL. At UFRJ, photo-absorption cross-sections for inner shell exitation will be measured while the kinetic energy spectra of the dissociation products (charged ions) will be measured at UFSC. This work is particularly timely with regard to plasma chemistry of silanes used in semiconductor processing. Progress should be rapid because the apparatus is already set up and in operation. Essential parts of the experimental work exist at each of the participating institutions so that the collaboration is essential for the research and clearly of mutual benefit to all three.