U.S.-Brazil Cooperative Research on: Collision Cross Sections and Spectroscopic Properties of Silicon Containing Molecules

该奖项支持加州理工学院喷气推进实验室的S. K. Srivastava与里约热内卢联邦大学（UFRJ）的G.G.B. de Souza和A.C.A. de Souza以及Ione Iga在分子碰撞截面方面的合作研究。李穆涛和Jose Carlos Nogueira来自巴西圣卡洛斯联邦大学（UFSC）。自1981年以来，斯里瓦斯塔瓦一直与这两个团体合作。提议的工作将在所有三个机构进行，巴西人在喷气推进实验室和美国方面在巴西的参与。对含硅分子的电离、解离和极性解离截面的测量将在JPL进行。在UFRJ，内壳激发的光吸收截面将被测量，而解离产物（带电离子）的动能谱将在UFSC被测量。这项工作对于半导体加工中硅烷的等离子体化学特别及时。进展应该是迅速的，因为设备已经建立并投入使用。实验工作的基本部分存在于每个参与机构，因此合作对研究至关重要，并且显然对所有三方都有利。

This award supports cooperative research on molecular collision cross-sections between S. K. Srivastava of the Jet Propulsion Laboratory, Caltech and G.G.B. de Souza and A.C.A. de Souza at the Universidade Federal do Rio de Janeiro (UFRJ) and Ione Iga, Lee Mu Tao and Jose Carlos Nogueira at the Universidade Federal do Sao Carlos (UFSC) in Brazil. Srivastava has collaborated with the two groups since 1981. The work proposed will be carried out at all three institutions with the participation of the Brazilians at JPL and the U.S. side in Brazil. Measurements of the cross-sections for molecules containing silicon for ionization, dissociative attachment and polar dissociation will be carried out at JPL. At UFRJ, photo-absorption cross-sections for inner shell exitation will be measured while the kinetic energy spectra of the dissociation products (charged ions) will be measured at UFSC. This work is particularly timely with regard to plasma chemistry of silanes used in semiconductor processing. Progress should be rapid because the apparatus is already set up and in operation. Essential parts of the experimental work exist at each of the participating institutions so that the collaboration is essential for the research and clearly of mutual benefit to all three.