U.S.-Brazil Cooperative Research on: Collision Cross Sections and Spectroscopic Properties of Silicon Containing Molecules

该奖项支持分子生物学领域的合作研究。 碰撞截面S. K.斯里瓦斯塔瓦 加州理工学院喷气推进实验室和GGB de Souza和A.C.A.德索萨在联邦大学 里约热内卢（UFRJ）和Ione伊加，Lee Mu Tao和 何塞卡洛斯诺盖拉在大学联邦做 巴西的圣卡洛斯（UFSC）。斯利瓦斯塔瓦已经 自1981年以来，他们一直与这两个团体合作。工作 将在所有三个机构开展拟议的 在喷气推进实验室的巴西人的参与下， 在巴西的美国方面。测量 含硅分子的横截面 电离、解离附着和极性 分离将在喷气推进实验室进行。在UFRJ， 内壳光吸收截面 激发将被测量，而动能 解离产物（带电离子）的光谱 将在UFSC进行测量。 这项工作对于血浆来说特别及时 半导体加工中使用的硅烷化学。 进展应该很快，因为该设备是 已经建立并投入使用。的基本部分 实验工作存在于每一个 参与机构，以便合作 是研究的关键， 对三者都有好处。

This award supports cooperative research on molecular collision cross-sections between S. K. Srivastava of the Jet Propulsion Laboratory, Caltech and G.G.B. de Souza and A.C.A. de Souza at the Universidade Federal do Rio de Janeiro (UFRJ) and Ione Iga, Lee Mu Tao and Jose Carlos Nogueira at the Universidade Federal do Sao Carlos (UFSC) in Brazil. Srivastava has collaborated with the two groups since 1981. The work proposed will be carried out at all three institutions with the participation of the Brazilians at JPL and the U.S. side in Brazil. Measurements of the cross-sections for molecules containing silicon for ionization, dissociative attachment and polar dissociation will be carried out at JPL. At UFRJ, photo-absorption cross-sections for inner shell exitation will be measured while the kinetic energy spectra of the dissociation products (charged ions) will be measured at UFSC. This work is particularly timely with regard to plasma chemistry of silanes used in semiconductor processing. Progress should be rapid because the apparatus is already set up and in operation. Essential parts of the experimental work exist at each of the participating institutions so that the collaboration is essential for the research and clearly of mutual benefit to all three.