Inorganic Thin Film Membranes for High Temperature Gas Separation

利用硅烷的氧化反应，CVD将在Vycor玻璃上沉积一层薄薄的二氧化硅。CVD反应受孔扩散的高度限制，因此沉积只发生在孔口处。可通过调节温度和压力来控制沉积深度。从该反应速率的文献数据来看，在0.5-5托的压力下，在300℃下可以沉积约1微米的薄膜。将测量氢气和其他气体通过复合膜的扩散系数。此外，为了测试反应器/分离器概念的可行性，将在由复合膜形成的管中进行若干平衡限制反应，其中氢是产物。实验的成功可能会导致高温气体分离膜的生产和组合反应器-分离器的可能性。

A thin layer of silica will be deposited on Vycor glass by CVD using the oxidation reaction of silane. The CVD reaction is highly pore-diffusion limited, so the deposition only occurs at the pore mouths. The depth of deposition can be controlled by adjusting the temperature and pressure. From the literature data on the rate of this reaction, a film of approximately 1 micron can be deposited at 300 C at 0.5-5 Torr pressure. The diffusivities of hydrogen and other gases through the composite membrane will be measured. Further, several equilibrium-limited reactions, in which hydrogen is a product, will be carried out in a tube formed by the composite membrane, in order to test the feasibility of the idea of reactor/separator. Success of the experiments could lead to the production of high temperature gas separation membranes and the possibility of a combined reactor-separator.