Output Intensity Limit of Semiconductor Lasers
Output Intensity Limit of Semiconductor Lasers
批准号:
8907873
负责人:
Hong Lee
金额:
$0.0万
依托单位:
依托单位国家:
美国
项目类别:
Continuing grant
财政年份:
1989
资助国家:
美国
项目状态:
已结题
起止时间:
1989-08-15 至 1991-07-31
中文摘要
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英文摘要
The phenomenon which limits the output intensity of semiconductor lasers is thermal runaway caused by nonradiative recombination at the laser mirror facet. One major objective of the proposed work is to develop a technique for removing the recombination centers and then stabilizing the surface with a thin passivating layer so that the centers are not regenerated. Possibly up to three orders of magnitude increase the maximum output intensity would be achieved if the surface could be made free of the nonradiative recombination centers. The other objective is to obtain a stability criterion for no thermal runaway in terms of active layer geometry and physical properties of other layers and heat sink. The criterion can be used to optimize for maximum output power. Achieving the two objectives could lead to a substantial increase in the maximum output intensity and could eliminate gradual degradation due to facet erosion.
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U.S.-Korea Cooperative Research on the Effects of Pore Size on Deactivation of Nickel Catalyst
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批准号:9002601
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项目类别:Standard Grant
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资助金额:$0.42万
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财政年份:1990
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负责人:Hong Lee
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依托单位:
U.S.-Korea Long-Term Visit for Cooperative Research on the Kinetics of Catalyst Sintering
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批准号:8819246
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项目类别:Standard Grant
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资助金额:$0.93万
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财政年份:1989
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负责人:Hong Lee
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依托单位:
Design and Development of a Novel CVD Reactor
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批准号:8712171
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项目类别:Standard Grant
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资助金额:$0.0万
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财政年份:1987
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负责人:Hong Lee
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依托单位:
Development of Kinetics of Sintering for Porous Supported Catalysts: Crystallite Migration and Effect of Catalyst Preparation
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批准号:8601884
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项目类别:Standard Grant
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资助金额:$0.0万
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财政年份:1986
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负责人:Hong Lee
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依托单位:
Development of Kinetics of Sintering in Porous, Supported Catalysts: Atomic Migration
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批准号:8318721
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项目类别:Standard Grant
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资助金额:$0.0万
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财政年份:1984
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负责人:Hong Lee
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依托单位:
Modeling and Optimization of a Fixed-Bed Reactor Under the Conditions of Catalyst Sintering
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批准号:8104713
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项目类别:Continuing grant
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资助金额:$0.0万
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财政年份:1981
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负责人:Hong Lee
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依托单位:
海外基金