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Engineering Research Equipment Grant: Surface Finishing of Ceramics; Acquisition of Lapping Equipment and Interference Microscope

Engineering Research Equipment Grant: Surface Finishing of Ceramics; Acquisition of Lapping Equipment and Interference Microscope
工程研究设备资助:陶瓷表面处理;
批准号:
8910895
负责人:
Srinivasan Chandrasekar
金额:
$5.61万
依托单位:
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
1989
资助国家:
美国
项目状态:
已结题
起止时间:
1989-08-01 至 1991-07-31

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中文摘要
翻译
这项工程研究设备赠款用于购买一台研磨机和一台干涉对比显微镜,用于陶瓷表面精加工研究。所获得的设备将用于以下具体研究:(A)研究研磨/抛光陶瓷表面上的残余应力和近表面位错;(B)表征研磨/抛光陶瓷表面的塑性变形引起的近表面电磁性能的变化,如磁导率、磁致伸缩和折射率;(C)开发超细研磨抛光、化学抛光和机械力化学抛光工艺;以及(D)研磨和抛光工艺的建模,以预测表面裂纹的性质、残余应力分布和界面温度。这项研究的最终目标是产生具有所需表面质量的原子光滑的陶瓷表面。
英文摘要
This engineering research equipment grant is for the acquisition of a lapping machine and an interference contrast microscope to be used in surface finishing studies on ceramics. The acquired equipment will be used in specific studies directed at: (a) investigating the residual stresses and the near surface dislocations on lapped/polished ceramic surfaces; (b) characterizing the plastic deformation induced changes in the near surface electromagnetic properties such as permeability, magnetostriction, and refractive index in lapped/polished ceramics; (c) developing ultra-fine abrasive finishing, chemical finishing, and mechano-chemical polishing processes; and (d) modeling of lapping and polishing processes to predict the nature of the surface cracking, the residual stress distribution, and interface temperatures. The ultimate goal of the research is the generation of up to atomically smooth ceramic surfaces with the desired surface quality.
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