ENGINEERING EQUIPMENT GRANT: CONTACT MASK ALIGNER FOR BINARY DIFFRACTIVE OPTICS

工程设备补助金：用于二元衍射光学器件的接触掩模对准器

• 批准号: 9006707
• 负责人: Raymond Kostuk
• 金额: $ 5万
• 依托单位: University of Arizona
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 1990
• 资助国家: 美国
• 起止时间: 1990-08-15 至 1994-01-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9006707&HistoricalAwards=false
• 关键词: ENGINEERING; EQUIPMENT; GRANT; CONTACT; MASK

The grant is for a high resolution contact mask aligner for use in fabricating binary phase diffractive optical elements. the instrument will greatly expand the on-going research efforts to: 1) improve basic knowledge of binary phase grating performance, 2) apply them in optical interconnect systems, and 3) design and test diffractive elements for use in magneto-optic data storage head assemblies. The requested mask aligner will extend mask alignment resolution capability to less than 0.4 micrometers, and is necessary for making the complex elements needed for the above applications. Successful demonstration of binary phase micro- optical components will have a major impact on the performance and realization of these systems. In addition to supporting these specific research projects, the equipment will be used to train students to fabricate binary phase gratings. This would satisfy a growing educational need expressed by several collaborating industrial and government laboratories.

该授权是用于制造二元相位衍射光学元件的高分辨率接触掩模对准器。该仪器将大大扩展正在进行的研究工作，以便：1)提高二相光栅性能的基本知识，2)将其应用于光互连系统，3)设计和测试用于磁光数据存储头组件的衍射元件。所要求的掩模对准器将掩模对准分辨率能力扩展到小于0.4微米，并且是制造上述应用所需的复杂元件所必需的。二相微光学元件的成功演示将对这些系统的性能和实现产生重大影响。除了支持这些特定的研究项目外，该设备还将用于培训学生制作二元相位光栅。这将满足几个工业和政府合作实验室所表达的日益增长的教育需求。