ENGINEERING EQUIPMENT GRANT: CONTACT MASK ALIGNER FOR BINARY DIFFRACTIVE OPTICS

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The grant is for a high resolution contact mask aligner for use in fabricating binary phase diffractive optical elements. the instrument will greatly expand the on-going research efforts to: 1) improve basic knowledge of binary phase grating performance, 2) apply them in optical interconnect systems, and 3) design and test diffractive elements for use in magneto-optic data storage head assemblies. The requested mask aligner will extend mask alignment resolution capability to less than 0.4 micrometers, and is necessary for making the complex elements needed for the above applications. Successful demonstration of binary phase micro- optical components will have a major impact on the performance and realization of these systems. In addition to supporting these specific research projects, the equipment will be used to train students to fabricate binary phase gratings. This would satisfy a growing educational need expressed by several collaborating industrial and government laboratories.