Engineering Research Equipment Grant for Residual Gas Analyzers for Novel Semiconductor Film Growth
Engineering Research Equipment Grant for Residual Gas Analyzers for Novel Semiconductor Film Growth
批准号:
9622282
负责人:
Walajabad Sampath
金额:
$1.42万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
1996
资助国家:
美国
项目状态:
已结题
起止时间:
1996-05-15 至 1999-04-30
中文摘要
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英文摘要
9622282 Sampath The Department of Mechanical Engineering at Colorado State University will purchase a residual gas analyzer (RGA) and the fixturing necessary for installation on our existing vacuum processing equipment. This processing equipment incorporates a unique technology, developed in our laboratory. This technology allows substrates for semiconductor and optical film processing to be transported directly from air into a vacuum environment where film growth can occur then back to air (AVA) with the transportation of substrates taking place in under a second. This novel capability allows very precise control over film growth. Unique processing and growth conditions are possible with the AVA technology. Furthermore, sample processing effort and experimental variability have been greatly decreased.. ***
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Ultrahigh Current Density Nitrogen Ion Implantation-- Effects on the Microstructure and High Cycle Fatigue Properties
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Manufacturing Process for Thin Walled Casting of Intricate Shapes
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依托单位:
国内基金
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