Research Initiation Awards: Kinetics of Diamond Film Growth

研究启动奖：金刚石膜生长动力学

• 批准号: 9009576
• 负责人: Peter Taborek
• 金额: $ 7万
• 依托单位: University of California-Irvine
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 1990
• 资助国家: 美国
• 起止时间: 1990-07-01 至 1993-06-30
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9009576&HistoricalAwards=false
• 关键词: Research; Initiation; Awards; Kinetics; Diamond

Flame growth of diamond films is controlled by nucleation on the substrate, and diffusion of the growth species through the boundary layer formed by the jet of hot gas. It is proposed to monitor these effects by in situ long focal distance microscopy using a Questar microscope. Edge-on observation of the impinging gas jet with this microscope, which provides 2 micron resolution at 15 cm, will allow us to map out the variation in the boundary layer thickness across the deposition area. This information will be used to study the effects of gas flow on the heat and mass transfer to the growing film. Direct high resolution observation of the substrate will allow one to make a real-time video of the growing film, and will help clarify the steps in the nucleation process. Work on electrochemical deposition will be more qualitative and exploratory, since no electrochemical diamond deposition process has yet been demonstrated. The search for a useful process will attempt to exploit analogies with electrodeposition of silicon, germanium and other refractory semiconductors. There has recently been an intense international research effort in the field of low pressure, low temperature diamond film growth. Because of the superlative properties of diamond, including hardness, thermal conductivity and chemical inertness, the potential impact of low cost diamond in many areas of technology would be very great. The goal of this research project is to investigate experimentally the kinetics of several promising diamond film growth techniques, including chemical combustion flame growth, plasma flame growth, and electrochemical deposition.

金刚石薄膜的火焰生长是由成核控制的。 衬底，以及生长物质通过衬底的扩散。 热气体喷射形成的边界层。 拟 通过原位长焦距监测这些影响 使用Questar显微镜进行显微镜检查。 边缘观察 冲击气体射流与这个显微镜，它提供了2 微米分辨率在15厘米，将使我们能够绘制出 边界层厚度的变化 沉积区。 这些信息将用于研究 气体流动对传热和传质的影响 成长电影 直接高分辨率观测 基板将允许一个使实时视频的 成长的电影，并将有助于澄清的步骤， 成核过程 电化学沉积的工作将 更定性和探索性，因为没有电化学 金刚石沉积工艺尚未得到证实。 的 寻找一个有用的过程将试图利用类比 通过电沉积硅、锗和其他 难熔半导体 最近有一项国际研究 在低压低温金刚石领域的努力 薄膜生长 由于最高级的属性， 金刚石，包括硬度，热导率和化学 惰性，低成本金刚石在许多领域的潜在影响 技术领域将会非常棒。 这个目标 研究项目是通过实验研究动力学 几种有前途的金刚石薄膜生长技术，包括 化学燃烧火焰生长、等离子体火焰生长，以及 电化学沉积