A Novel Large Area Microwave Source for Diamond Thin Film Deposition

该计划的目标是开发一个原型的 新型大面积薄膜微波金刚石沉积反应器。 目前用于沉积薄金刚石的微波反应器， 来自气相的类金刚石膜限于小直径， 通常为2-3英寸。 实现更大面积薄膜的可能性 将为这些涂层开辟新的可能性， 腐蚀、化学、电学、光学和硬度性能。 这种膜以多种形式存在直接的商业应用。 市场。 所提出的反应器设计利用了微波等离子体的物理特性 形成以产生空间均匀的化学激发的 将处理气体输送到其上生长薄膜的衬底。 在 然而，为了获得这种均匀的流动，中性气体流体流动， 等离子体产生和微波耦合必须仔细地建模， 为了提供设计工具， 原理原型 在第一阶段，这些建模工具将 开发和原型设计工作图纸创建。 同相 二是建立样机并进行优化。

The objective of the proposed program is to develop a prototype of a novel large area, thin film, microwave diamond deposition reactor. Present microwave reactors for the deposition of thin diamond and diamond-like films from the gas phase are limited to small diameters, typically 2-3". The possibility of achieving larger area thin films would open new possibilities for these coatings which possess unique corrosion, chemical, electrical, optical and hardness properties. There are direct commercial applications for such films in a variety of markets. The proposed reactor design exploits the physics of microwave plasma formation to generate a spatially uniform flux of chemically excited process gas to the substrate on which the thin film is grown. In order to attain this uniform flow, however, neutral gas fluid flows, plasma generation and microwave coupling must be carefully modeled in order to provide design tools with which to refine initial proof of principle prototypes. In Phase I these modeling tools would be developed and a prototype design working drawings created. In Phase II, the prototype would be built and optimized.