Epitaxy, Structure, Stress, and Plastic Behavior in High Strength Metal Multilayers

该提案的目的是通过研究溅射沉积法合成多层结构，并对其进行原位表征，以及对其力学性能的测量，来探索多层结构的潜力。掠入射x射线散射用于检测沉积过程中的表面和界面。薄膜是由面心立方和体心立方金属对交替合成的。这些薄膜为研究抑制位错运动的精细间隔障碍的强化提供了机会，并将这种强化与薄膜外延、薄膜厚度和错配应变联系起来。该程序的一个优点是使用了原位分析技术，这可能导致对薄膜生长的新理解。

The aim of the proposal is to explore the potential of multilayer structures by studying their synthesis by sputter deposition with in-situ characterization as well as measurement of their mechanical properties. Grazing incidence X-ray scattering is used to examine the surface and interfaces during deposition. The films are synthesized with alternating face-centered cubic and body-centered cubic metal pairs. These films offer the opportunity to study strengthening by finely spaced obstacles that inhibit dislocation motion and relating this strengthening to film epitaxy, film thickness and misfit strains. A strength in the program is the use of an in-situ analysis technique, which could lead to new understanding of film growth.