Epitaxy, Structure, Stress, and Plastic Behavior in High Strength Metal Multilayers

高强度金属多层膜中的外延、结构、应力和塑性行为

• 批准号: 9100271
• 负责人: Bruce Clemens
• 金额: $ 34.14万
• 依托单位: Stanford University
• 依托单位国家: 美国
• 项目类别: Continuing Grant
• 财政年份: 1991
• 资助国家: 美国
• 起止时间: 1991-07-01 至 1994-12-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9100271&HistoricalAwards=false
• 关键词: Epitaxy; Structure; Stress; Plastic; Behavior

The aim of the proposal is to explore the potential of multilayer structures by studying their synthesis by sputter deposition with in-situ characterization as well as measurement of their mechanical properties. Grazing incidence X-ray scattering is used to examine the surface and interfaces during deposition. The films are synthesized with alternating face-centered cubic and body-centered cubic metal pairs. These films offer the opportunity to study strengthening by finely spaced obstacles that inhibit dislocation motion and relating this strengthening to film epitaxy, film thickness and misfit strains. A strength in the program is the use of an in-situ analysis technique, which could lead to new understanding of film growth.

该提案的目的是探索多层 通过研究它们的溅射沉积合成结构， 原位表征以及测量其机械性能 特性. 掠入射X射线散射用于检查 沉积过程中的表面和界面。 薄膜 面心立方和体心立方交替合成 立方金属对。 这些电影提供了学习的机会 通过精细间隔的障碍物来加强， 并将这种强化与薄膜外延、薄膜 厚度和失配应变。 该计划的一个优势是使用 现场分析技术，这可能会导致新的 了解电影的成长