Role of Defects in Chemical Vapor Deposition (CVD) Diamond and Related Phases

缺陷在化学气相沉积 (CVD) 金刚石及相关相中的作用

• 批准号: 9104072
• 负责人: Andrzej Badzian
• 金额: $ 26万
• 依托单位: Pennsylvania State Univ University Park
• 依托单位国家: 美国
• 项目类别: Continuing Grant
• 财政年份: 1991
• 资助国家: 美国
• 起止时间: 1991-09-15 至 1995-03-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9104072&HistoricalAwards=false
• 关键词: Role; Defects; Chemical; Vapor; Deposition

This project addresses basic research issues on the synthesis and processing of diamond films. Microwave plasma assisted chemical vapor deposition is used to synthesize the films under a variety of deposition conditions, and a parametric variation of these conditions will be conducted to achieve films with improved structural, optical, and electronic properties. Emphasis will be placed on the characterization of the effects that lattice defects have on the electronic and optical properties. The research program seeks to obtain fundamental information on the nucleation and growth of three crystallographic orientations, (100), (110), and (111), and to understand the details of atomic structure in these growth sectors. Diamond films have many potential technological applications ranging from wear-resistant coatings to more sophisticated and demanding uses such as primary electronic and optical materials with particular advantages for use in high temperature environments.

本项目涉及关于综合的基本研究问题， 金刚石薄膜的加工。 微波等离子体辅助化学 气相沉积用于在各种条件下合成膜。 沉积条件以及这些条件的参数变化 条件将进行，以获得具有改善的 结构、光学和电子性质。 重点将 放置在表征的影响，晶格缺陷 对电子和光学性质的影响。 研究 该计划旨在获得有关成核的基本信息 以及三个晶体取向的生长，（100），（110）， 和（111），并了解原子结构的细节， 这些增长部门。 金刚石薄膜具有许多潜力 技术应用范围从耐磨涂层， 更复杂和要求更高的用途，如初级电子 和光学材料具有特别的优点， 温度环境。