Acquisition of a Modern Hot Press

这种新型热压机将用于制备具有微设计界面缺陷结构的陶瓷样品。热压机能够在低至10_3-10-4的压力下达到至少1600℃的温度，速度约为1-2℃/min。它将设在材料科学与矿物工程系的陶瓷研究实验室。受影响最大的研究项目涉及将光刻技术与离子束蚀刻和热压相结合以产生微设计界面结构的方法。该方法允许进行模型实验，研究烧结过程中的高温裂纹愈合、孔隙边界相互作用、孔隙阻力、孔隙粗化以及孔隙消除和网络演化。教师正在进行的项目包括微设计界面应用于裂纹愈合研究和陶瓷材料的孔隙边界相互作用，陶瓷-陶瓷连接，陶瓷-金属界面研究，其研究项目包括烧结研究。与其他大学和行业的科学家合作的研究课题包括陶瓷-金属界面的断裂行为、蠕变空化、内腔表面的偏析、单晶晶须的气相生长和无损检测。大约有12名研究生直接与教师和几名本科生一起工作。

This new hot press will to be used to fabricate ceramic samples with microdesigned interfacial defect structures. The hot press is capable of reaching a temperature of at least 1600 C, at pressures as low as 10_3-10-4, at a rate of about 1-2 C/min. It would be housed in the Ceramics Research Laboratory, within the Department of Materials Science and Mineral Engineering. The research programs most affected involve a method of combining photolitho- graphic techniques with ion beam etching and hot pressing to produce microdesigned interface structures. The method allows model experiments investigating high-temperature crack healing, pore boundary interaciton, pore drag, pore coarsening, and pore elimination and network evolution during sintering. Examples of projects underway by faculty members include applications of microdesigned interfaces to crack healing studies and pore-boundary interactions in ceramic materials, ceramic-ceramic joining, ceramic-metal interface studies, whose research projects include sintering studies. Collaborative research topics with scientists at other universities and industry include fracture behavior of ceramic-metal interfaces, creep cavitation, segregation to internal cavity surfaces, vapor phase growth of single crystal whiskers, and NDE. About 12 graduate students are working with the faculty members directly and several undergraduates.