Extra Large Field Size Sub-Quarter Micron Lithography

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POC proposes to develop a totally new lensless lithography machine using a combination of microprisms and waveguide holograms which will produce images within a sub 0.25um resolution. This machine will have high resolution, large field masks, and minimum aberration. Both theoretical and experimental efforts will be made in Phase I to fully determine the limits of this approach and the possibility of designing a practical lithography machine for integrated circuit applications. Technical issues including material requirements, diffraction limits of different holographic optical systems (HOS), aberration magnification/demagnification, noise elimination and power distribution and uniformity will intensively studied. Holographic materials that can provide image resolution0.1um are available for this program based on POC's proprietary HOE fabrication techniques.