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Process Modeling of a Novel Plasma Enhanced Vapor DepositionConcept Using Statistical Design of Experiments

Process Modeling of a Novel Plasma Enhanced Vapor DepositionConcept Using Statistical Design of Experiments
使用实验统计设计对新型等离子体增强气相沉积概念进行过程建模
批准号:
9160419
负责人:
Mandar Sunthankar
金额:
$4.99万
依托单位:
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
1992
资助国家:
美国
项目状态:
已结题
起止时间:
1992-01-01 至 1992-09-30

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中文摘要
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英文摘要
Cadmium is electroplated in cyanide baths in 1,166 facilities across the United States. During the past two decades, considerable research has been conducted to reduce toxic chemical discharge from cadmium electroplating operations. However, economical elimination of cadmium discharge or sludge has not been reported. To address the environmental issues related to cadmium electroplating, a novel plasma enhanced vapor deposition concept was developed in the laboratory. In addition to high deposition rates for cadmium and zinc, the feasibility of in-situ cadmium reclamation to eliminate toxic chemical discharge was demonstrated. It is also feasible to extend this concept to deposit or reclaim zinc-cadmium alloys. However, an understanding of the effect of process variables on the deposition rate and properties of cadmium is required. A systematic research using statistical experimental design methods will develop this understanding. The research could lead to an environmentally acceptable cadmium vapor plating process (Dry Plating) as an alternative to cyanide electroplating.
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SBIR Phase I: Advancing a Novel Low-voltage Electric Arc Method to Oxidize Organic Material in Contaminated Water
  • 批准号:
    1113110
  • 项目类别:
    Standard Grant
  • 资助金额:
    $15.0万
  • 财政年份:
    2011
  • 负责人:
    Mandar Sunthankar
  • 依托单位:
SBIR Phase II: An Economical Continuous Metal Coating Method for Electronic and Other Applications
  • 批准号:
    0078622
  • 项目类别:
    Standard Grant
  • 资助金额:
    $40.0万
  • 财政年份:
    2000
  • 负责人:
    Mandar Sunthankar
  • 依托单位:
SBIR Phase I: Study of Macroparticle Growth and Its Effect on Relatively Thick Functional Physical Vapor Deposition (PVD) Coatings
  • 批准号:
    9860404
  • 项目类别:
    Standard Grant
  • 资助金额:
    $10.0万
  • 财政年份:
    1999
  • 负责人:
    Mandar Sunthankar
  • 依托单位:
Dry Plating Apparatus and Process Development
  • 批准号:
    9301881
  • 项目类别:
    Standard Grant
  • 资助金额:
    $25.0万
  • 财政年份:
    1994
  • 负责人:
    Mandar Sunthankar
  • 依托单位:
国内基金
海外基金
Galaxy Analytical Modeling Evolution (GAME) and cosmological hydrodynamic simulations.
  • 批准号:
  • 项目类别:
    省市级项目
  • 资助金额:
    10.0万元
  • 批准年份:
    2025
  • 负责人:
    Antonios Katsianis
  • 依托单位: