Process Modeling of a Novel Plasma Enhanced Vapor DepositionConcept Using Statistical Design of Experiments

使用实验统计设计对新型等离子体增强气相沉积概念进行过程建模

• 批准号: 9160419
• 负责人: Mandar Sunthankar
• 金额: $ 4.99万
• 依托单位: IonEdge Corporation
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 1992
• 资助国家: 美国
• 起止时间: 1992-01-01 至 1992-09-30
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9160419&HistoricalAwards=false
• 关键词: Process; Modeling; Novel; Plasma; Enhanced

Cadmium is electroplated in cyanide baths in 1,166 facilities across the United States. During the past two decades, considerable research has been conducted to reduce toxic chemical discharge from cadmium electroplating operations. However, economical elimination of cadmium discharge or sludge has not been reported. To address the environmental issues related to cadmium electroplating, a novel plasma enhanced vapor deposition concept was developed in the laboratory. In addition to high deposition rates for cadmium and zinc, the feasibility of in-situ cadmium reclamation to eliminate toxic chemical discharge was demonstrated. It is also feasible to extend this concept to deposit or reclaim zinc-cadmium alloys. However, an understanding of the effect of process variables on the deposition rate and properties of cadmium is required. A systematic research using statistical experimental design methods will develop this understanding. The research could lead to an environmentally acceptable cadmium vapor plating process (Dry Plating) as an alternative to cyanide electroplating.

在1，166个设施的氰化物槽中电镀镉 在美国各地。 在过去的二十年里， 已经进行了大量的研究以减少有毒化学品 镉电镀作业的排放。 然而，在这方面， 经济地消除镉排放或污泥还没有 报道 处理与镉有关的环境问题 电镀，一种新的等离子体增强气相沉积概念 是在实验室里开发的。 除了高沉积 率镉和锌，原位镉的可行性 示范了如何通过填海消除有毒化学品排放。 将这一概念扩展到存款或收回也是可行的 锌镉合金 然而，对影响的理解 工艺参数对镉沉积速率和性能的影响 是必需的. 采用统计实验设计的系统研究 方法将发展这种理解。 这项研究可能会导致 环境可接受的镉气相电镀工艺（干式 电镀）作为氰化物电镀的替代品。