SBIR Phase I: Study of Macroparticle Growth and Its Effect on Relatively Thick Functional Physical Vapor Deposition (PVD) Coatings
SBIR Phase I: Study of Macroparticle Growth and Its Effect on Relatively Thick Functional Physical Vapor Deposition (PVD) Coatings
批准号:
9860404
负责人:
Mandar Sunthankar
金额:
$10.0万
依托单位:
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
1999
资助国家:
美国
项目状态:
已结题
起止时间:
1999-01-01 至 1999-06-30
中文摘要
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英文摘要
9860404 This Small Business Innovation Research (SBIR) Phase I project proposes a novel physical vapor deposition (PVD) alternative to conventional electroplating used in depositing relatively thick functional metal coatings. Electroplating operations are known to generate large quantities of hazardous waste and toxic fumes. The PVD approach will obviate the use of liquid chemicals, recycle solid metals in situ, and leave no emissions. The concept is a non-line-of-site deposition of metals at high rates, which will allow the growth of relatively thick (greater than 10 microns) and uniform deposits of metals on three-dimensional objects simultaneously from all sides. In this way, it may be possible to deposit a large number of small objects or a small number of large objects in a relatively short period. Phase I will explore the effect of process parameters on degrading inclusions in the growing film and the integrity of such thick films. Process modeling, using the statistical design of experiments, will be performed. Chrome, copper, nickel, and other relatively thick coatings are extensively used in the defense, electronics, aerospace, and automotive industries. It is anticipated that high quality, thick functional metal coatings will be deposited in an environmentally safe manner.
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SBIR Phase I: Advancing a Novel Low-voltage Electric Arc Method to Oxidize Organic Material in Contaminated Water
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批准号:1113110
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项目类别:Standard Grant
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资助金额:$15.0万
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财政年份:2011
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依托单位:
SBIR Phase II: An Economical Continuous Metal Coating Method for Electronic and Other Applications
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资助金额:$40.0万
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财政年份:2000
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依托单位:
Dry Plating Apparatus and Process Development
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批准号:9301881
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项目类别:Standard Grant
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资助金额:$25.0万
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财政年份:1994
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负责人:Mandar Sunthankar
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依托单位:
Process Modeling of a Novel Plasma Enhanced Vapor DepositionConcept Using Statistical Design of Experiments
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批准号:9160419
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项目类别:Standard Grant
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资助金额:$4.99万
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财政年份:1992
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负责人:Mandar Sunthankar
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依托单位:
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