A Unique and New Plasma Assisted Deposition Technique Utilizing In-Situ Renucleation

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New technologies for producing useful products with engineered microstructure and properties for optimized mechanical performance creates an insatiable demand for materials processing and manufacturing. Plasma assisted chemical vapor deposition (PACVD) is a new technique for materials processing that has the capability to substantially enhance deposition rates. "Working" of a deposition surface can cause continued renucleation to produce a very fine grained deposit, defect and stress free that is smooth to virtually any thickness with substantially improved mechanical properties. The program will develop a high watt density plasma chemical vapor deposition (CVD) process coupled with continual in- situ "working" of the deposition surface to achieve extraordinarily high deposition rates in a very fine grained stress free deposits with mechanical properties substantially greater than conventional materials. The process will be demonstrated with difficult to fabricate refractory materials.