Intrinsically Absorbing Polymers for Anti-Reflective CoatingApplications

第二阶段的研究将提供一个知识基础， 用于开发新一代抗反射 使用本征吸收的涂层产品 高分子材料 它将确定分子 结构影响光学、物理、可加工性 聚合物在真实的生活中的性能 条件 内吸性聚合物薄膜， 抗反射涂层（ARC）的应用是一个 与染色聚合物相比， 系统. 通过增加光密度和 消除抗蚀剂混合问题，这种新的 这种方法使ARC技术得以扩展 I线和深紫外光刻。

Phases II research will provide a knowledge base for developing new generation anti-reflective coating products using intrinsically absorbing polymer materials. It will establish how molecular structure affects the optical, physical, processibility properties of the polymers in real life lithographic conditions. Intrinsically absorbing polymer films for anti-reflective coatings (ARC) applications is a significant technological advance over dyed polymer systems. By increasing optical density and eliminating resist mixing problems, this new approach allows ARC technology to be extended into I-line and DUV lithography.