Intrinsically Absorbing Polymers for Anti-Reflective CoatingApplications

第二阶段的研究将为利用本征吸收高分子材料开发新一代增透涂料产品提供知识基础。它将确定分子结构如何影响聚合物在现实生活光刻条件下的光学、物理和可加工性。本征吸收聚合物薄膜在抗反射涂层（ARC）中的应用是相对于染色聚合物系统的重大技术进步。通过增加光密度和消除抗蚀剂混合问题，这种新方法允许ARC技术扩展到i线和DUV光刻。

Phases II research will provide a knowledge base for developing new generation anti-reflective coating products using intrinsically absorbing polymer materials. It will establish how molecular structure affects the optical, physical, processibility properties of the polymers in real life lithographic conditions. Intrinsically absorbing polymer films for anti-reflective coatings (ARC) applications is a significant technological advance over dyed polymer systems. By increasing optical density and eliminating resist mixing problems, this new approach allows ARC technology to be extended into I-line and DUV lithography.