SBIR Phase I: Highly Plasma Etch-Resistant Electron Beam Resists for Sub-150nm Applications

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9860346 This Small Business Innovation Research Phase I project from Brewer Science Inc. will demonstrate a new negative-working electron beam resist for sub-150 nm lithography. The current portfolio of electron beam resist products is based primarily on organic polymers with poor plasma etching resistance. Yet these resists are of critical importance in the microelectronics industry, for future mask production and eventually for IC production by projection and direct write electron beam lithography. The resist concept which Brewer Sciences Inc. will pursue in this work will overcome the limitations of current resist products by utilizing a radiation-crosslinkable organotitanium polymer as the primary resist component, in order to achieve high sensitivity and resolution at 50kV exposure energies along with exceptional plasma etching resistance.