Catadioptric Lens for Excimer Laser Lithography

用于准分子激光光刻的折反射透镜

• 批准号: 9301920
• 负责人: David Elliot
• 金额: $ 24.99万
• 依托单位: Excimer Laser Systems Inc
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 1994
• 资助国家: 美国
• 起止时间: 1994-10-01 至 1996-09-30
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9301920&HistoricalAwards=false
• 关键词: Catadioptric; Lens; Excimer; Laser; Lithography

The phase II Research Project will encompass a series of imagine tests at 248nm with the catadioptric lens, using thin coatings of deep-UV resists to obtain maximum resolution. We will then fabricate a 193nm version of the lens and test it with the same criteria used at 248nm. In parallel with this task we will fabricate a step-and-repeat imagine platform and integrate a 3- motion (x,y,z) state system, viewing optics, CRT monitor, lens and delivery optics. Prior to running tests with the imagine platform, we will test two different homogenizer designs, selecting the best one for final tests. We will also run an optics damage threshold test on the critical optical surfaces to determine the maximum energy we can deliver through the system to the wafer substrates. Finally, the integration of the delivery optics with the selected homogenizer will take place, completing the imaging platform; we will mount the operator viewing optics above the x, y, and z stages, connect a CRT monitor and run a series of 193nm maximum resolution and maximum energy tests. The most advanced deep-UV resists will be used for samples, and data taken on field resolution, field uniformity, and energy transmission efficiency of the complete optical train. Data will be generated on both the lithographic properties of the entire system, as well as the capabilities for photoablation reactions. This data will identify the potential of the technology for commercial applications. ***

第二阶段的研究项目将包括一系列248nm反射透镜的想象测试，使用深紫外抗蚀剂的薄涂层来获得最大的分辨率。然后，我们将制造一个193nm版本的镜头，并使用与248nm相同的标准进行测试。与此任务并行，我们将制造一个步进重复想象平台，并集成三运动（x,y,z）状态系统，观看光学元件，CRT显示器，镜头和传送光学元件。在imagine平台上运行测试之前，我们将测试两种不同的均质机设计，选择最佳设计进行最终测试。我们还将对关键光学表面进行光学损伤阈值测试，以确定我们可以通过系统向晶圆基板传递的最大能量。最后，将传输光学器件与选定的均质器集成，完成成像平台；我们将在x， y和z级上安装操作员观察光学器件，连接CRT显示器并运行一系列193nm最大分辨率和最大能量测试。最先进的深紫外抗蚀剂将用于样品，以及整个光学序列的场分辨率，场均匀性和能量传输效率的数据。将生成关于整个系统的光刻特性和光消融反应能力的数据。这些数据将确定该技术在商业应用方面的潜力。＊＊＊