New and Emerging Techniques for Imaging Surfaces Workshop; Washington, DC; April 18-21, 1993

本次研讨会讨论了当前重要的科学 与材料科学、表面物理学和 化学. 会议将于2009年10月25日至26日在华盛顿，华盛顿特区举行。 4月18日至4月21日，并以一种 戈登研究会议。 它旨在覆盖一个 广泛的表面显微镜：透射电子显微镜 显微术;反射电子显微术;低能 电子显微术;低能透射显微术; 扫描电子显微镜;磁成像 显微镜检查;扫描反射电子显微镜检查; X射线 吸收显微镜;光电子显微镜; 场离子显微镜;扫描隧道显微镜;和 反射高能电子衍射。 除了提供对当前技术的回顾之外， 研讨会将讨论这些方向 技术将在未来的领导方面， 他们能提供的科学数据。 一份报告将 准备在公开文献中发表。

This workshop addresses current important scientific issues related to materials science, surface physics, and chemistry. It will be held in Washington, D.C. from April 18 to April 21, and is organized in the style of a Gordon Research Conference. It is designed to cover a wide range of surface microscopies: Transmission Electron Microscopy; Reflection Electron Microscopy; Low Energy Electron Microscopy; Low Energy Transmission Microscopy; Scanning Transission Electron Microscopy; Magnetic Imaging Microscopy; Scanning Reflection Electron Microscopy; X-ray Apsorption Microscopy; Photoelectron Electron Microscopy; Field Ion Microscopy; Scanning Tunneling Microscopy; and Reflection High Energy Electron Diffraction. In addition to providing a review of current techniques, the workshop will address the directions that these techniques will be headed in the future in terms of the scientific data that they can provide. A report will be prepared for publication in the open literature.