New and Emerging Techniques for Imaging Surfaces Workshop; Washington, DC; April 18-21, 1993

本研讨会讨论当前与材料科学、表面物理和化学相关的重要科学问题。它将于4月18日至4月21日在华盛顿特区举行，并以戈登研究会议的风格组织。它的设计涵盖了广泛的表面显微镜：透射电子显微镜；反射电子显微镜；低能电子显微镜；低能透射显微镜；扫描透射式电子显微镜；磁成像显微镜；扫描反射电子显微镜；X射线吸收显微镜；光电子显微镜；场离子显微镜；扫描隧道显微镜；反射高能电子衍射。除了提供对当前技术的审查外，讲习班还将根据这些技术所能提供的科学数据，探讨这些技术今后的发展方向。将编写一份报告，以便在公开文献上发表。

This workshop addresses current important scientific issues related to materials science, surface physics, and chemistry. It will be held in Washington, D.C. from April 18 to April 21, and is organized in the style of a Gordon Research Conference. It is designed to cover a wide range of surface microscopies: Transmission Electron Microscopy; Reflection Electron Microscopy; Low Energy Electron Microscopy; Low Energy Transmission Microscopy; Scanning Transission Electron Microscopy; Magnetic Imaging Microscopy; Scanning Reflection Electron Microscopy; X-ray Apsorption Microscopy; Photoelectron Electron Microscopy; Field Ion Microscopy; Scanning Tunneling Microscopy; and Reflection High Energy Electron Diffraction. In addition to providing a review of current techniques, the workshop will address the directions that these techniques will be headed in the future in terms of the scientific data that they can provide. A report will be prepared for publication in the open literature.