New and Emerging Techniques for Imaging Surfaces Workshop; Washington, DC; April 18-21, 1993

本次研讨会将讨论当前与材料科学、表面物理和化学相关的重要科学问题。它将于4月18日至4月21日在华盛顿特区举行，并以戈登研究会议的方式组织。它旨在涵盖广泛的表面显微镜：透射电子显微镜；反射电子显微镜；低能电镜；低能透射显微术；扫描透射电镜；磁成像显微镜；扫描反射电镜；x射线吸收显微术；光电子显微镜；场离子显微镜；扫描隧道显微术；和反射高能电子衍射。除了对现有技术进行回顾之外，研讨会还将讨论这些技术在未来能够提供的科学数据方面的发展方向。将编写一份报告，以便在公开文献中发表。

This workshop addresses current important scientific issues related to materials science, surface physics, and chemistry. It will be held in Washington, D.C. from April 18 to April 21, and is organized in the style of a Gordon Research Conference. It is designed to cover a wide range of surface microscopies: Transmission Electron Microscopy; Reflection Electron Microscopy; Low Energy Electron Microscopy; Low Energy Transmission Microscopy; Scanning Transission Electron Microscopy; Magnetic Imaging Microscopy; Scanning Reflection Electron Microscopy; X-ray Apsorption Microscopy; Photoelectron Electron Microscopy; Field Ion Microscopy; Scanning Tunneling Microscopy; and Reflection High Energy Electron Diffraction. In addition to providing a review of current techniques, the workshop will address the directions that these techniques will be headed in the future in terms of the scientific data that they can provide. A report will be prepared for publication in the open literature.