U.S.-Japan Seminar: Atomic Scale Mechanisms of Epitaxial Growth/May 8-15, 1995/Honolulu, Hawaii

该奖项支持10名美国科学家参加将于1995年5月8日至15日在夏威夷举行的关于外延生长原子尺度机制的美日研讨会。联合组织者是犹他大学的Gerald Stringfellow博士和东京大学的taau Nishinaga教授。本次研讨会的主要目的是讨论气相外延的基本化学和物理方面。来自美国和日本学术界和工业界的主要研究人员将进行互动和交流，这将使我们对外延的基本理解得到更快的发展。具体来说，研讨会将包括：表面物理、表面化学、热力学和均相反应动力学。美国参与者在外延生长技术领域提供了广泛的专业知识和地域代表性，并且是在美国最活跃的研究人员的基础上被选中的。因此，该提案通过国际合作实现了该计划在科学知识交流和转移方面的目标。＊＊＊

9415261 Stringfellow This award supports the participation of 10 U.S. scientists in a U.S.-Japan seminar on Atomic Scale Mechanisms of Epitaxial Growth, to be held in Hawaii from May 8-15, 1995. The co-organizers are Dr. Gerald Stringfellow of the University of Utah and Professor Tatau Nishinaga of the University of Tokyo. The main purpose of this seminar is to discuss fundamental chemical and physical aspects of vapor phase epitaxy. Leading researchers from both academia and industry in the U.S. and Japan will interact and exchange ideas that will lead to more rapid development of our fundamental understanding of epitaxy. Specifically, the seminar will include topics on: surface physics, surface chemistry, thermodynamics, and homogeneous reaction kinetics. The U.S. participants provide a broad cross section of expertise and geographical representation in the area of epitaxial growth techniques, and were selected on the basis of being the most active researchers in the U.S. Therefore, this proposal fulfills the objectives of the Program in its exchange and transfer of scientific knowledge through an international collaboration. ***