The Creation of a New Coating Technology Using the Sequential Ion Implantation/Deposition Technique

使用顺序离子注入/沉积技术创建新的涂层技术

• 批准号: 9420084
• 负责人: Leonard Topoleski
• 金额: $ 4.87万
• 依托单位: University of Maryland Baltimore County
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 1994
• 资助国家: 美国
• 起止时间: 1994-09-01 至 1995-10-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9420084&HistoricalAwards=false
• 关键词: Creation; New; Coating; Technology; Using

9420084 Topoleski An SGER award will support feasibility testing of a conceptual coating process which involves alternating steps of ion implantation and plasma deposition. The aim is to combine the excellent adhesion created by the ion implanted mixed layers with the more rapid deposition of material by the plasma technique. The coatings will be processed at a facility in Russia which has the capability of switching between the two processes without sample removal or bpeaking of the vacuum. The integrity and strength of the coatings will be determined by scratct testing and microscopy. ***

9420084 Topoleski一个SGER奖将支持概念涂层工艺的可行性测试，该工艺涉及离子注入和等离子体沉积的交替步骤。 目的是将离子注入混合层产生的优异粘附性与等离子体技术更快速的材料沉积联合收割机相结合。涂层将在俄罗斯的一家工厂进行处理，该工厂能够在两种工艺之间切换，而无需取出样品或降低真空度。 涂层的完整性和强度将通过划痕试验和显微镜检查确定。 ***