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The Creation of a New Coating Technology Using the Sequential Ion Implantation/Deposition Technique

The Creation of a New Coating Technology Using the Sequential Ion Implantation/Deposition Technique
使用顺序离子注入/沉积技术创建新的涂层技术
批准号:
9420084
负责人:
Leonard Topoleski
金额:
$4.87万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
1994
资助国家:
美国
项目状态:
已结题
起止时间:
1994-09-01 至 1995-10-31

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中文摘要
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英文摘要
9420084 Topoleski An SGER award will support feasibility testing of a conceptual coating process which involves alternating steps of ion implantation and plasma deposition. The aim is to combine the excellent adhesion created by the ion implanted mixed layers with the more rapid deposition of material by the plasma technique. The coatings will be processed at a facility in Russia which has the capability of switching between the two processes without sample removal or bpeaking of the vacuum. The integrity and strength of the coatings will be determined by scratct testing and microscopy. ***
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