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The Creation of a New Coating Technology Using the Sequential Ion Implantation/Deposition Technique

The Creation of a New Coating Technology Using the Sequential Ion Implantation/Deposition Technique
使用顺序离子注入/沉积技术创建新的涂层技术
批准号:
9420084
负责人:
Leonard Topoleski
金额:
$4.87万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
1994
资助国家:
美国
项目状态:
已结题
起止时间:
1994-09-01 至 1995-10-31

项目摘要

项目成果

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中文摘要
翻译
SGER奖将支持一种概念性涂层工艺的可行性测试,该工艺涉及离子注入和等离子体沉积的交替步骤。目的是将离子注入混合层产生的优异附着力与等离子体技术更快的材料沉积结合起来。这些涂层将在俄罗斯的一个工厂进行加工,该工厂有能力在两种工艺之间切换,而无需去除样品或调整真空。涂层的完整性和强度将通过划痕测试和显微镜来确定。***
英文摘要
9420084 Topoleski An SGER award will support feasibility testing of a conceptual coating process which involves alternating steps of ion implantation and plasma deposition. The aim is to combine the excellent adhesion created by the ion implanted mixed layers with the more rapid deposition of material by the plasma technique. The coatings will be processed at a facility in Russia which has the capability of switching between the two processes without sample removal or bpeaking of the vacuum. The integrity and strength of the coatings will be determined by scratct testing and microscopy. ***
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