NSF Young Investigator

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9457758 Aydil Chemically reactive gas plasma, used in microelectronics processing, will be studied. The objective of this research is to understand how the process conditions dictate the properties of the plasmas, the transport phenomena and gas phase and surface kinetics, which in turn affect the properties of the materials processed. The research is organized along two lines: developing and improving new experimental plasma and surface diagnostic techniques that give fundamental information on the surface and gas phase chemistry, and using these techniques to study and manipulate processing conditions and engineering designs in order to produce materials with desired properties in applications such as plasma-enhanced chemical vapor deposition. ***