In-Line Process Monitoring and Control for Poly-Silicon Formation Inside Cluster Tools

这个小企业创新研究项目将开发一种傅里叶变换红外（FT-IR）反射光谱仪，用于在线监测和控制集群工具内的多晶硅工艺。先进的燃料研究Inc. (AFR)已申请专利并开发了一种基于FTIR的方法，该方法消除了与现有技术相关的许多问题。1)它可以在组合工具中实时准确地确定沉积态多晶硅膜的厚度。2)它可以以非破坏性的方式确定多晶硅膜中的实时掺杂密度; 3）它可以直接监测产品晶圆上多晶硅工艺的厚度和掺杂密度; 4）它可以同时和独立地确定盖SiO2层和热SiO2层的厚度。在德州仪器的Centura 5200集群工具的冷却室中进行的现场测试证明了在线逐晶圆数据收集的能力。对多晶硅产品晶片进行了非原位分析，取得了很好的结果。根据该方法开发了一个软件包，并首次商业销售给SEMATECH。该项目将由Advanced Fuel Research，Inc.领导。（非洲）。德州仪器公司(11)将成为分包商。SEMATECH将是一个合作者。第一阶段将证明在线监测的可行性，在多晶硅过程中的Centura 5200集群工具。TI将制造校准样品。SEMATECH将提供来自不同IC制造商的样品。AFR将测量非原位膜特性，并改进分析方法和软件。现场测试将在TI进行。第二阶段将采用监测技术，并证明这一进程的可靠性有所提高。

This Small Business Innovation Research Project will develop a Fourier Transform Infrared (FT-IR) reflectance spectrometer for in-line monitoring and control of poly-silicon processes within a cluster tool. Advanced Fuel Research. Inc. (AFR) has patented and developed a FTIR based method which eliminates many of the problems associated with present techniques. 1) It can determine accurate real-time thickness for as-deposited poly-silicon film inside the cluster tool. 2) It can determine the real-time doping density in the poly-silicon film in nondestructive way; 3) It can monitor the thicknesses and doping density for poly-silicon processes on the product wafer directly; 4) It can determine the thicknesses of the cap SiO2 Layer and the thermal SiO2 layer, simultaneously and independently. A field test in the cooldown chamber of a Centura 5200 cluster tool at Texas Instruments demonstrated the ability of on-line wafer-by-wafer data collection. An ex-situ analysis of poly-silicon product wafers, achieved excellent results. A software package is developed based on this method, and the first commercial sale is to SEMATECH. This project will be led by Advanced Fuel Research, Inc. (AFR). Texas Instruments, Inc. (11) will be a subcontractor. SEMATECH will be a collaborator. Phase I will prove the feasibility of in-line monitoring during the poly silicon processes in a Centura 5200 cluster tool. TI will fabricate calibration samples. SEMATECH will provide samples from different IC manufacturing. AFR will measure the ex-situ film characteristics, and improve the analysis method and software. Field tests will be done at TI. Phase II will implement the monitoring techniques and demonstrate the improved reliability of the process.