Conformal Ion Implantations Development for Surface Modification

表面改性的共形离子注入开发

• 批准号: 9460545
• 负责人: Richard Adler
• 金额: $ 6.48万
• 依托单位: North Star Research Corporation
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 1995
• 资助国家: 美国
• 起止时间: 1995-02-01 至 1995-11-30
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9460545&HistoricalAwards=false
• 关键词: Conformal; Ion; Implantations; Development; Surface

Ion implantation can change the properties of a surface without changing the underlying substrate. This technology has growing applications to wear reduction and corrosion reduction of metal surfaces. Many of these applications have been limited by the fact that implantation is usually a `line of sight process`. Plasma source ion implantation (PSII) has the potential to overcome this limitation as long as the plasma can be made to `conform` to the surface throughout the implant's duration. Limitations in plasma density and power system drive conditions often limit the degree to which the implant conforms to the surface. By increasing the plasma density and power system peak power, those limitations can be overcome, leading to a significant improvement in the uniformity of the implant and a subsequent increase in implant utility as a surface modification technique. By combining NSRC's expertise in high current pulse transformer design with improved high density plasma sources North Star Research Corp., can develop a system which overcomes the present limitations of PSII. In this Phase I program, the researchers will use existing pulsed power equipment at NSRC along with a high density plasma source to make an initial study of the high density, high power PSII regime. Preliminary implants will be performed to validate this new technique.

离子注入可以改变表面的性质而不改变下面的衬底。 该技术在减少金属表面的磨损和腐蚀方面的应用越来越多。 这些应用中有许多受到植入通常是“视线过程”这一事实的限制。等离子体源离子注入（PSII）具有克服这种限制的潜力，只要等离子体能够在整个注入期间与表面“一致”。等离子体密度和功率系统驱动条件的限制通常限制植入物与表面的贴合程度。通过增加等离子体密度和功率系统峰值功率，可以克服这些限制，从而显著改善注入的均匀性，并随后增加作为表面改性技术的注入效用。通过将NSRC在高电流脉冲Transformer设计方面的专业知识与改进的高密度等离子体源North星星研究公司相结合， 可以开发一个系统，克服目前PSII的局限性。在第一阶段计划中，研究人员将使用NSRC现有的脉冲功率设备沿着高密度等离子体源，对高密度、高功率PSII机制进行初步研究。 将进行初步植入，以验证这项新技术。