Conformal Ion Implantations Development for Surface Modification

离子注入可以在不改变衬底的情况下改变表面的性质。该技术在减少金属表面磨损和腐蚀方面的应用越来越广泛。许多此类应用都受到植入通常是“视线过程”这一事实的限制。等离子体源离子注入（PSII）有潜力克服这一限制，只要等离子体在整个植入期间能够“符合”表面。等离子体密度和电力系统驱动条件的限制通常会限制植入物与表面的贴合程度。通过增加等离子体密度和功率系统峰值功率，可以克服这些限制，从而显著改善植入物的均匀性，并随后增加植入物作为表面改性技术的实用性。通过将NSRC在大电流脉冲变压器设计方面的专业知识与改进的高密度等离子体源相结合，北极星研究公司可以开发出一种克服PSII目前局限性的系统。在第一阶段项目中，研究人员将使用NSRC现有的脉冲功率设备以及高密度等离子体源，对高密度、高功率PSII进行初步研究。将进行初步植入以验证这项新技术。

Ion implantation can change the properties of a surface without changing the underlying substrate. This technology has growing applications to wear reduction and corrosion reduction of metal surfaces. Many of these applications have been limited by the fact that implantation is usually a `line of sight process`. Plasma source ion implantation (PSII) has the potential to overcome this limitation as long as the plasma can be made to `conform` to the surface throughout the implant's duration. Limitations in plasma density and power system drive conditions often limit the degree to which the implant conforms to the surface. By increasing the plasma density and power system peak power, those limitations can be overcome, leading to a significant improvement in the uniformity of the implant and a subsequent increase in implant utility as a surface modification technique. By combining NSRC's expertise in high current pulse transformer design with improved high density plasma sources North Star Research Corp., can develop a system which overcomes the present limitations of PSII. In this Phase I program, the researchers will use existing pulsed power equipment at NSRC along with a high density plasma source to make an initial study of the high density, high power PSII regime. Preliminary implants will be performed to validate this new technique.