GOALI: "Run-to-Run Feedback Control of Semiconductor Manufacturing Processes"
目标:“半导体制造工艺的运行反馈控制”
基本信息
- 批准号:9510625
- 负责人:
- 金额:$ 3.19万
- 依托单位:
- 依托单位国家:美国
- 项目类别:Standard Grant
- 财政年份:1995
- 资助国家:美国
- 起止时间:1995-10-01 至 1997-03-31
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
9510625 Krogh The objective of this project is to develop methods for using in- line measurements from semiconductor manufacturing processes to adjust process operating points from run to run to compensate for sources of systematic drift in the process variables. Semiconductor manufacturing processes are typically monitored using statistical process control (SPC) techniques, and adjustments are made in operating setpoints only when out-of- control conditions are detected. This approach cannot effectively compensate for systematic parameter variations such as drifts in the process operating environment, material properties, or equipment conditions. Consequently, methods for adjusting the process operating point from run to run are needed to improve the quality and yield of semiconductor manufacturing processes when it is too costly or physically impossible to eliminate systematic variations. This project will combine techniques developed for system identification, parameter estimation, and feedback control, with methods for statistical and physical modeling to perform effective run-to-run control for key processes in a commercial photovoltaic cell manufacturing facility. Parameterized models will be developed to characterized the input-output relations for each process, and so-called gray-box parameter estimation, Kalman filtering, and constrained optimization will be applied to update the process setpoints for each process run based on post-process measurements from previous runs. A primary emphasis of this work will be to develop methods for incorporating process knowledge from physical models and empirical data into the on-line computations to more effectively compensate for the process variations. The key trade-off to be explored is the complexity of the models versus the efficiency and effectiveness of the on- line parameter estimation and control computations. In addition to these immediate technical objectives, this one- year project sponsored under the NSF GOALI program will enable the principal investigator, who is currently working in the area of semiconductor process control, to gain valuable experience working with industrial scientists and engineers in a commercial semiconductor manufacturing facility. The research will be conducted at - and supported in part by - EBARA Solar, Inc. Models will be obtained using process data from EBARA, and the run-to-run feedback control techniques will be implemented on actual production equipment to evaluate their effectiveness. This experience will contribute significantly to the definition of future theoretical and applied research directions in model- based control of complex manufacturing processes. ***
小行星9510625 本项目的目标是开发使用半导体制造过程的在线测量来调整过程操作点的方法,以补偿过程变量中的系统漂移源。 半导体制造过程通常被监控 使用统计过程控制(SPC)技术,只有在检测到失控情况时才对操作设定点进行调整。 这种方法不能有效地补偿系统参数变化,例如过程操作环境、材料特性或设备条件中的漂移。 因此,当成本太高或在物理上不可能消除系统变化时,需要用于在运行之间调整工艺操作点的方法来提高半导体制造工艺的质量和产量。 该项目将结合联合收割机技术开发的系统识别,参数估计和反馈控制,统计和物理建模的方法,以执行有效的运行到运行控制的关键过程中的商业光伏电池制造设施。 将开发参数化模型来表征每个过程的输入-输出关系,并且将应用所谓的灰箱参数估计、卡尔曼滤波和约束优化来基于来自先前运行的过程后测量来更新每个过程运行的过程设定点。 这项工作的主要重点将是开发方法,将过程知识的物理模型和经验数据到在线计算,以更有效地补偿过程的变化。 要探索的关键权衡是模型的复杂性与在线参数估计和控制计算的效率和有效性。 除了这些直接的技术目标,这个由NSF GOALI计划赞助的为期一年的项目将使目前在半导体工艺控制领域工作的首席研究员能够获得与工业科学家和工程师在商业半导体制造设施中合作的宝贵经验。 这项研究将在EBARA Solar,Inc.进行,并得到部分支持。 将使用EBARA的过程数据获得模型,并在实际生产设备上实施运行到运行的反馈控制技术,以评估其有效性。 这一经验将大大有助于定义未来的理论和应用研究方向在基于模型的控制复杂的制造过程。 ***
项目成果
期刊论文数量(0)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
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Bruce Krogh其他文献
VigilNet: An Integrated Sensor Network System for Energy-E(cid:14)cient Surveillance
VigilNet:用于 Energy-E(cid:14)cient 监控的集成传感器网络系统
- DOI:
- 发表时间:
- 期刊:
- 影响因子:0
- 作者:
T. He;S. Krishnamurthy;Liqian Luo;Ting Yan;Lin Gu;R. Stoleru;Gang Zhou;Qing Cao;P. Vicaire;J. Stankovic;Tarek F. Abdelzaher;Jonathan Hui;Bruce Krogh - 通讯作者:
Bruce Krogh
Bruce Krogh的其他文献
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{{ truncateString('Bruce Krogh', 18)}}的其他基金
CPS: Medium: GOALI: An Architecture Approach to Heterogeneous Verfication of Cyber-Physical Systems
CPS:中:GOALI:网络物理系统异构验证的架构方法
- 批准号:
1035800 - 财政年份:2010
- 资助金额:
$ 3.19万 - 项目类别:
Standard Grant
CSR-EHCS(CPS),TM: Architectures, Abstractions and Algorithms for Cyber-Physical Networks
CSR-EHCS(CPS),TM:信息物理网络的架构、抽象和算法
- 批准号:
0834701 - 财政年份:2008
- 资助金额:
$ 3.19万 - 项目类别:
Standard Grant
Beyond Supervisory Control and Data Acquisition (SCADA) National Workshop
超越监控和数据采集 (SCADA) 国家研讨会
- 批准号:
0647037 - 财政年份:2006
- 资助金额:
$ 3.19万 - 项目类别:
Standard Grant
A Planning Project to Redesign the Delivery of Fundamentals in a Flexible Electrical and Computer Engineering Curriculum
重新设计灵活的电气和计算机工程课程基础知识交付的规划项目
- 批准号:
0431920 - 财政年份:2004
- 资助金额:
$ 3.19万 - 项目类别:
Standard Grant
Collaborative Research: Embedded Control Systems for X-by-Wire Applications
合作研究:线控应用的嵌入式控制系统
- 批准号:
0410568 - 财政年份:2004
- 资助金额:
$ 3.19万 - 项目类别:
Standard Grant
Integrated Sensing: Virtual Sensor-Actuator Arrays
集成传感:虚拟传感器执行器阵列
- 批准号:
0225449 - 财政年份:2002
- 资助金额:
$ 3.19万 - 项目类别:
Continuing Grant
CRCD: Instructional Modules for Embedded Control System Design
CRCD:嵌入式控制系统设计教学模块
- 批准号:
0088064 - 财政年份:2001
- 资助金额:
$ 3.19万 - 项目类别:
Continuing Grant
Student Travel Grant for Hybrid Systems: Computation and Control
混合系统学生旅费补助:计算和控制
- 批准号:
0071303 - 财政年份:2000
- 资助金额:
$ 3.19万 - 项目类别:
Standard Grant
A Cooperative U.S.-German Research Project on Computer-Aided Analysis and Design of Hybrid Systems
美德混合系统计算机辅助分析与设计合作研究项目
- 批准号:
9726527 - 财政年份:1998
- 资助金额:
$ 3.19万 - 项目类别:
Standard Grant
Performance - Based Switching Control Systems
基于性能的开关控制系统
- 批准号:
9812213 - 财政年份:1998
- 资助金额:
$ 3.19万 - 项目类别:
Standard Grant
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