Low Energy Ion Scattering and Scanning Tunneling Microscope Studies of the Nucleation and Growth of Islands on Surfaces

低能离子散射和扫描隧道显微镜研究表面岛的成核和生长

基本信息

  • 批准号:
    9521392
  • 负责人:
  • 金额:
    $ 27万
  • 依托单位:
  • 依托单位国家:
    美国
  • 项目类别:
    Standard Grant
  • 财政年份:
    1996
  • 资助国家:
    美国
  • 起止时间:
    1996-07-01 至 1999-06-30
  • 项目状态:
    已结题

项目摘要

9521392 Williams The phenomena of nucleation and growth of metals and metalloid islands (Ni, Ag, In, Sn, Sb, and Te), on semiconductor surfaces (Si) will be investigated. Techniques of Time-of Flight Low Energy Ion Scattering will be used to measure the coverage of the surface islands during material deposition to obtain kinetic information. Scanning Tunneling Microscopy (STM) will provide spatial information such as shape, size and densities of the islands, which can be related to thermodynamic properties of the system. The experimental data will be compared with computer simulations to determine growth mechanisms and physical parameters, especially surface diffusion constants and line tensions for different adsorbates. Materials with a broad range of properties and behaviors have been selected. STM will also provide information on the size dependence of the electronic property of the islands and the unique properties of supported clusters. %%% The ultimate objective in this research is to understand the kinetic and thermodynamic processes of nucleation and growth so that the formation of an optimized structure of dots, lines, and/or planes can be guided through control of deposition parameters such as flux, fluence and substrate temperature. The selected Materials have a broad range of properties and behaviors. Techniques of Time-of Flight Low Energy Ion Scattering will provide information on the coverage of the surface islands during material deposition to obtain kinetic information. Scanning Tunneling Microscopy (STM) will be used to study spatial information such as shape, size and densities of the islands, which can be related to thermodynamic properties of the system. The experimental data will be compared with computer simulations data to determine growth mechanisms and physical parameters, especially surface diffusion constants and line tensions for different adsorbates STM will also p rovide information on the size dependence of the electronic property of the islands and the unique properties of supported clusters. ***
9521392威廉姆斯将研究金属和类金属岛(镍、银、铟、锡、锑和碲)在半导体表面(Si)上的成核和生长现象。飞行时间低能离子散射技术将被用来测量材料沉积过程中表面岛屿的覆盖率,以获得动力学信息。扫描隧道显微镜(STM)将提供岛屿的形状、大小和密度等空间信息,这些信息可能与系统的热力学性质有关。实验数据将与计算机模拟进行比较,以确定生长机制和物理参数,特别是不同吸附物的表面扩散常数和线张力。选择了具有广泛性能和行为的材料。扫描隧道显微镜还将提供有关岛屿电子性质的大小依赖关系以及所支持的团簇的独特性质的信息。本研究的最终目标是了解成核和生长的动力学和热力学过程,以便通过控制沉积参数,如流量、流量和衬底温度,指导形成优化的点、线和/或面结构。选定的材料具有广泛的属性和行为。飞行时间低能离子散射技术将提供材料沉积过程中表面岛屿覆盖率的信息,以获得动力学信息。扫描隧道显微镜(STM)将被用来研究空间信息,如岛屿的形状、大小和密度,这些信息可能与系统的热力学性质有关。实验数据将与计算机模拟数据进行比较,以确定生长机制和物理参数,特别是不同吸附材料的表面扩散常数和线张力,STM还将提供有关岛屿电子性质的尺寸依赖关系和负载团簇的独特性质的信息。***

项目成果

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R. Stanley Williams其他文献

Conduction centers in a Ta2O5−δ Fermi glass
Axon-like active signal transmission
轴突样的主动信号传递
  • DOI:
    10.1038/s41586-024-07921-z
  • 发表时间:
    2024-09-11
  • 期刊:
  • 影响因子:
    48.500
  • 作者:
    Timothy D. Brown;Alan Zhang;Frederick U. Nitta;Elliot D. Grant;Jenny L. Chong;Jacklyn Zhu;Sritharini Radhakrishnan;Mahnaz Islam;Elliot J. Fuller;A. Alec Talin;Patrick J. Shamberger;Eric Pop;R. Stanley Williams;Suhas Kumar
  • 通讯作者:
    Suhas Kumar
Elastic energy mapping of epitaxial nanocrystals
  • DOI:
    10.1007/s00339-004-3175-z
  • 发表时间:
    2005-03-01
  • 期刊:
  • 影响因子:
    2.800
  • 作者:
    G. Medeiros-Ribeiro;A. Malachias;S. Kycia;R. Magalhães-Paniago;T.I. Kamins;R. Stanley Williams
  • 通讯作者:
    R. Stanley Williams
Silicon–germanium interdiffusion and interfaces in self-assembled quantum dots
自组装量子点中的硅-锗互扩散和界面
  • DOI:
  • 发表时间:
    2006
  • 期刊:
  • 影响因子:
    0
  • 作者:
    R. Vanfleet;D. Basile;T. Kamins;J. Silcox;R. Stanley Williams
  • 通讯作者:
    R. Stanley Williams
Structural and chemical stability of thin films of Pt–Ga intermetallic compounds of GaAs(001)
  • DOI:
    10.1557/jmr.1990.2139
  • 发表时间:
    2011-01-31
  • 期刊:
  • 影响因子:
    2.900
  • 作者:
    Young K. Kim;Delroy A. Baugh;David K. Shuh;R. Stanley Williams;Larry P. Sadwick;Kang L. Wang
  • 通讯作者:
    Kang L. Wang

R. Stanley Williams的其他文献

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{{ truncateString('R. Stanley Williams', 18)}}的其他基金

Symposium: Materials Research at the Crossroads of Physical and Solid-State Chemistry; American Chemical Society National Meeting; Washington, DC; August 21-26, 1994
研讨会:物理和固态化学十字路口的材料研究;
  • 批准号:
    9419688
  • 财政年份:
    1994
  • 资助金额:
    $ 27万
  • 项目类别:
    Standard Grant
Surface Crystallography from Backscattering and Recoiling of1-15keV Ions and Atoms
1-15keV 离子和原子的背散射和反冲的表面晶体学
  • 批准号:
    9213669
  • 财政年份:
    1992
  • 资助金额:
    $ 27万
  • 项目类别:
    Continuing Grant
Surface Crystallography by Low-Energy Ion Scattering
低能离子散射表面晶体学
  • 批准号:
    8820391
  • 财政年份:
    1989
  • 资助金额:
    $ 27万
  • 项目类别:
    Continuing Grant
Ion-Scattering Spectroscopy for Near-Surface Crystallography(Materials Research)
用于近表面晶体学的离子散射光谱(材料研究)
  • 批准号:
    8521663
  • 财政年份:
    1986
  • 资助金额:
    $ 27万
  • 项目类别:
    Continuing Grant
Ion-Scattering Spectroscopy for Surface Structure Analysis (Materials Research)
用于表面结构分析的离子散射光谱(材料研究)
  • 批准号:
    8204858
  • 财政年份:
    1982
  • 资助金额:
    $ 27万
  • 项目类别:
    Continuing Grant

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