International Research Fellow Awards Program: Specimen Fabrication and Atom Probe Analysis of Metallic Multi-Layer Thin Film Structures

国际研究员奖励计划：金属多层薄膜结构的样品制作和原子探针分析

• 批准号: 9600327
• 负责人: David Larson
• 金额: $ 5.28万
• 依托单位: Fellowships
• 依托单位国家: 美国
• 项目类别: Fellowship Award
• 财政年份: 1996
• 资助国家: 美国
• 起止时间: 1996-09-01 至 1998-08-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9600327&HistoricalAwards=false
• 关键词: International; Research; Fellow; Awards; Program

9600327 Larson The International Research Fellow Awards Program enables U.S. scientists and engineers to conduct three to twentyfour months of research abroad. The program's awards provide opportunities for joint research, and the use of unique or complementary facilities, expertise and experimental conditions abroad. This award will support a twelve-month postdoctoral research visit by Dr. David J. Larson to work with Dr. Alfred Cerezo at the University of Oxford on a project entitled, "Specimen Fabrication and Atom Probe Analysis of Metallic Multilayer Thin Film Structures." The objective of this project is to correlate interfacial structure with magnetic properties in multilayer films. This will be done by 1) development of a specimen preparation technique for multilayer film (MLF) structures which allows atom probe analysis when the film normal is parallel to the tip axis and the films have not been prepared by sputtering or evaporating onto a highly curved sample and 2) atom probe field ion microscopy (APFIM) characterization of MLF structure for the purpose of correlating deposition and processing conditions with interfacial structure and ultimately, with magnetic properties. This correlation will allow optimization and reproducibility of the most important magnetic properties of MLFs for commercial applications. ***

小行星9600327 国际研究员奖励计划使美国科学家和工程师能够在国外进行三到二十四个月的研究。该计划的奖项提供了联合研究的机会，以及使用国外独特或互补的设施，专业知识和实验条件。 该奖项将支持大卫J.拉森博士与阿尔弗雷德Cerezo博士在牛津大学进行为期12个月的博士后研究访问，该项目名为“金属多层薄膜结构的样品制造和原子探针分析”。" 本计画的目标是将多层膜的界面结构与磁性相关联。这将通过1）开发多层膜（MLF）结构的样品制备技术，该技术允许在膜法线平行于尖端轴且膜未通过溅射或蒸发制备到高度弯曲的样品上时进行原子探针分析，以及2）原子探针场离子显微镜（AP）为了将沉积和处理条件与界面结构并最终与磁性能相关联，需要对MLF结构进行表征。 这种相关性将允许最重要的磁性能的MLF的商业应用的优化和再现性。 ***