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Research Equipment Grant: High-Resolution Mask Aligner

Research Equipment Grant: High-Resolution Mask Aligner
研究设备补助金:高分辨率掩模对准器
批准号:
9622716
负责人:
Dan Botez
金额:
$6.0万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
1996
资助国家:
美国
项目状态:
已结题
起止时间:
1996-07-01 至 1997-06-30

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中文摘要
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英文摘要
9622716 Botez The Department of Electrical and Computer Engineering at the University of Wisconsin-Madison will purchase a high-resolution (0.4um) mask aligner equipped with backside illumination, which will be dedicated to support research in engineering. The equipment will be used for several research projects, including in particular: high-index-step phase-locked arrays of antiguided diode lasers; monolithically integrated flared-antiguided master oscillator power amplifiers; novel micromachined millimeter-wave antennas and circuits; micromachined devices; and superconducting vortex flow transistors fabricated in high-temperature superconducting thin films. ***
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Uncooled, High-Efficiency Mid-Infrared Lasers by Using Intersubband Quantum-Box Structures
  • 批准号:
    0925104
  • 项目类别:
    Continuing Grant
  • 资助金额:
    $39.99万
  • 财政年份:
    2009
  • 负责人:
    Dan Botez
  • 依托单位:
Surface-Emitting Active Photonic Lattices for Watt-Range Coherent Power
  • 批准号:
    0200321
  • 项目类别:
    Continuing Grant
  • 资助金额:
    $22.5万
  • 财政年份:
    2002
  • 负责人:
    Dan Botez
  • 依托单位:
Surface-Emitting High-Power(>0.1W) Single-Lobe, Single-Mode Diode Lasers
  • 批准号:
    9820969
  • 项目类别:
    Continuing Grant
  • 资助金额:
    $23.0万
  • 财政年份:
    1999
  • 负责人:
    Dan Botez
  • 依托单位:
High-Power, Phase-Locked Single-Frequency Arrays of Diode Lasers
  • 批准号:
    9522035
  • 项目类别:
    Continuing Grant
  • 资助金额:
    $21.55万
  • 财政年份:
    1995
  • 负责人:
    Dan Botez
  • 依托单位:
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