Research Equipment Grant: High-Resolution Mask Aligner

研究设备补助金：高分辨率掩模对准器

• 批准号: 9622716
• 负责人: Dan Botez
• 金额: $ 6万
• 依托单位: University of Wisconsin-Madison
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 1996
• 资助国家: 美国
• 起止时间: 1996-07-01 至 1997-06-30
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9622716&HistoricalAwards=false
• 关键词: Research; Equipment; Grant; Resolution; Mask

9622716 Botez The Department of Electrical and Computer Engineering at the University of Wisconsin-Madison will purchase a high-resolution (0.4um) mask aligner equipped with backside illumination, which will be dedicated to support research in engineering. The equipment will be used for several research projects, including in particular: high-index-step phase-locked arrays of antiguided diode lasers; monolithically integrated flared-antiguided master oscillator power amplifiers; novel micromachined millimeter-wave antennas and circuits; micromachined devices; and superconducting vortex flow transistors fabricated in high-temperature superconducting thin films. ***

9622716 Botez 威斯康星大学麦迪逊分校电气与计算机工程系将购买一台配备背面照明的高分辨率（0.4um）掩模对准器，专门用于支持工程研究。 该设备将用于多个研究项目，特别包括：反导二极管激光器的高折射率阶跃锁相阵列；单片集成喇叭形反制主振荡器功率放大器；新型微机械毫米波天线和电路；微机械装置；以及在高温超导薄膜中制造的超导涡流晶体管。 ***