Real Time Studies of the Evolution of Structural, Optical, and Electronic Properties in Thin Films

w：\awards\awards96\*.doc 9622774柯林斯 真实的 时间光谱椭偏仪（SE）和偏振仪，结合通过直接技术的微结构分析，将被应用于表征成核、聚结和生长过程以及薄膜的光学性质。 这里应用的SE技术是独特的，在他们的能力，以确定的光学性能和电子结构与单层灵敏度作为一个连续的函数的厚度的薄膜制造的方法广泛采用在工业上，例如，等离子体增强化学气相沉积和磁控溅射。 本研究分为两个项目：（一）半导体薄膜的制备及在 这些膜，因为他们从集群通过合并阶段不断增长的演变，和（ii）气体成分，衬底材料和衬底温度上的金刚石膜的结合和结构的演变的作用。 所研究的材料系统在薄膜光伏器件、光子和电子发射器件以及光学和机械涂层中具有广泛的应用。 因此，将在以下方面建立协同关系： 该计划和其他计划与工业转让新的仪器设计，材料技术和人力资源。 在真空条件下从蒸汽源生长的薄膜将被研究，因为它们是形成的，原子层一层一层。这些研究将利用新的高速测量技术，包括将偏振的白色光束导入反应器，从生长膜的表面反射，并检测反射后的偏振变化。 这些技术提供了具有原子层灵敏度的膜的厚度、膜的生长速率及其光学性质，后者 包括折射率 和 吸收系数 待研究的薄膜包括非晶和晶体半导体，应用于光学和电子器件，如太阳能电池和发光二极管， 金刚石用作光学、机械和电子发射涂层。 该方案有四个目标：（一）发展 高 灵敏度光学仪器， (ii)更好地了解薄膜是如何生长的，（iii）根据这种理解优化薄膜的特定应用，以及（iv）建立本计划与其他计划之间的协同关系，与工业界合作，转让新的仪器设计，材料技术和人力资源。 ***

w:\awards\awards96\*.doc 9622774 Collins Real time spectroscopic ellipsometry (SE) and polarimetry, combined with microstructural analysis by direct techniques will be applied to characterize the nucleation, coalescence, and growth processes as well as the optical properties of thin films. The SE techniques applied here are unique in their ability to determine the optical properties and electronic structure with monolayer sensitivity as a continuous function of thickness for films fabricated by methods employed widely in industry, for example, plasma-enhanced chemical vapor deposition and magnetron sputtering. The research is divided into two projects: (I) the preparation of semiconductor films and the study of size effects in these films as they evolve from clusters through the coalescence stage to continuous growth, and (ii) the role of gas composition, substrate material, and substrate temperature on the evolution of bonding and structure in diamond films. The materials systems studied have a wide range of applications in thin film photovoltaic devices, photon and electron emission devices, and optical and mechanical coatings. As a result, synergistic relationships will be established between this program and other programs with industry for the transfer of new instrument designs, materials technologies, and human resources. %%% The growth of thin films under vacuum from vapor sources will be studied as they are formed, atomic layer-by-layer. Such studies will make use of novel, high-speed measurement techniques that involve directing a polarized white light beam into the reactor, reflecting it from the surface of the growing film, and detecting the change in polarization upon reflection. These techniques provide the thickness of the film with atomic layer sensitivity, the growth rate of the film, and its optical properties, t he latter including the index of refraction and absorption coefficient. The films to be studied include amorphous and crystalline semiconductors, with applications in optical and electronic devices such as solar cells and light-emitting diodes, and diamond with applications as optical, mechanical, and electron-emitting coatings. The program has four goals: (i) developing high sensitivity optical instrumentation, (ii) obtaining a better understanding of how thin films grow, (iii) optimizing thin films for specific applications based on this understanding, and (iv) establishing synergistic relationships between this program and other programs with industry for the transfer of new instrument designs, materials technologies, and human resources. ***