Growth and Characterization of New Interlayer Materials for Reproducible High-Tc Josephson Junctions
Growth and Characterization of New Interlayer Materials for Reproducible High-Tc Josephson Junctions
批准号:
9705839
负责人:
Ying Liu
金额:
$45.0万
依托单位国家:
美国
项目类别:
Continuing Grant
财政年份:
1997
资助国家:
美国
项目状态:
已结题
起止时间:
1997-09-01 至 2001-08-31
中文摘要
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英文摘要
ECS-9705839 Ying Liu A three year activity is being undertaken during which time, Professors Liu and Schlom will study epitaxial La-doped SrTiO3 and related films deposited on YBCO, with the goal of fabricating reproducible Josephson junction devices using a novel double ramp design. The PIs focus their proposal on growing and characterising the material, and have teamed with a researcher at the Jet Propulsion Laboratory (Kleinsasser) who will provide the device expertise necessary to impact high Tc electronic device applications.
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