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SBIR PHASE II: A Compact, Intense Positron Beam Source for Materials Analysis

SBIR PHASE II: A Compact, Intense Positron Beam Source for Materials Analysis
SBIR PHASE II:用于材料分析的紧凑型强正电子束源
批准号:
9712258
负责人:
Ruth Shefer
金额:
$30.0万
依托单位:
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
1998
资助国家:
美国
项目状态:
已结题
起止时间:
1998-01-01 至 2001-12-31

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中文摘要
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英文摘要
9712258 Shefer This Small Business Innovation Research Phase II project will develop the first turn-key, self-shielded accelerator-based intense positron beam source for use in research and industrial laboratories. Positron beams are powerful diagnostic probes for the nondestructive evaluation of metals, semiconductors, and polymers as well as for fundamental investigations of materials structure. A major impediment to the further development and use of positron-based diagnostics is the lack of suitable sources of intense slow positron beams. Presently-available radioisotope or electron LINAC sources are much too large and expensive for use in a laboratory or industrial environment. The positron source is based on the production of the short-lived (+-emitter 13N via the light ion reaction 12C(d,n)13N. The Phase I study showed that a low energy deuteron accelerator with a specially-designed carbon target and positron moderator will be able to provide slow positron fluxes equal to or greater than 107 e+/sec. The source, to be constructed in Phase II, will utilize a compact, high current accelerator. In addition to providing a relatively intense beam, the accelerator-based source will be easy to operate, and will contain little residual radioactivity when not in use. The initial market for the 13N-based intense slow positron source developed in this program will be university and industrial laboratories in the U.S. and abroad which are already using positron beams. The availability of the proposed source will facilitate the more widespread use of positron-based diagnostic techniques for semiconductors and metals. If these techniques come into routine use, the customer base for a diagnostic instrument based on this source may include the majority of semiconductor manufacturing facilities. ***
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SBIR PHASE I: A Compact, Intense Positron Beam Source for Materials Analysis
  • 批准号:
    9561398
  • 项目类别:
    Standard Grant
  • 资助金额:
    $7.5万
  • 财政年份:
    1996
  • 负责人:
    Ruth Shefer
  • 依托单位:
国内基金
海外基金
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  • 项目类别:
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  • 资助金额:
    --
  • 批准年份:
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  • 负责人:
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  • 依托单位:
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  • 批准号:
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  • 项目类别:
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  • 资助金额:
    3350万元
  • 批准年份:
    2019
  • 负责人:
    刘衍文
  • 依托单位:
地幔含水相Phase E的温度压力稳定区域与晶体结构研究
  • 批准号:
    41802035
  • 项目类别:
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  • 资助金额:
    12.0万元
  • 批准年份:
    2018
  • 负责人:
    张里
  • 依托单位:
基于数字增强干涉的Phase-OTDR高灵敏度定量测量技术研究