CAREER: The Chemistry of Etching: Understanding Kinetic Surface Morphologies on an Atomic Scale

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This Faculty Early Career Development (CAREER) project, supported in the Analytical and Surface Chemistry Program, focuses on the detailed microscopic, macroscopic, and computational characterization of etched silicon surfaces. In particular, the use of a new class of aqueous, fluorine-based etchants will be investigated. Professor Hines and her students at Cornell University will employ scanning tunneling microscopy to study the physical structure (quality) of the resultant etch patterns while etch rate measurements will give evidence of the kinetics of the process. Monte Carlo calculations will be incorporated to help simulate the observed chemistry. This CAREER project will improve the computational skills of undergraduates and graduates through the implementation of a `Numerical Analysis for Chemists` course. Professor Hines will also improve students' readiness for the workforce through seminars in writing and public speaking skills. The study and development of new chemistries which can be applied to semiconductor processing systems continues to be a very vibrant area of research. Professor Hines and her students at Cornell University are combining physical measurement techniques and computational simulations to evaluate the use of a new family of aqueous, fluorine-based etchants. Previous studies have suggested that atomically flat silicon surfaces could be produced by these methods. This CAREER project holds the promise of producing results of substantial technological importance. Professor Hines will enhance the development of scientists with skills in the important area of computational chemistry through the introduction of a new undergraduate/graduate student course in that area. Technical writing and public speaking skills will be developed through topical seminars and coursework.