CAREER: The Chemistry of Etching: Understanding Kinetic Surface Morphologies on an Atomic Scale

职业：蚀刻化学：了解原子尺度上的动力学表面形态

• 批准号: 9733165
• 负责人: Melissa Hines
• 金额: $ 30.5万
• 依托单位: Cornell University
• 依托单位国家: 美国
• 项目类别: Continuing Grant
• 财政年份: 1998
• 资助国家: 美国
• 起止时间: 1998-02-15 至 2003-01-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9733165&HistoricalAwards=false
• 关键词: CAREER; Chemistry; Etching; Understanding; Kinetic

This Faculty Early Career Development (CAREER) project, supported in the Analytical and Surface Chemistry Program, focuses on the detailed microscopic, macroscopic, and computational characterization of etched silicon surfaces. In particular, the use of a new class of aqueous, fluorine-based etchants will be investigated. Professor Hines and her students at Cornell University will employ scanning tunneling microscopy to study the physical structure (quality) of the resultant etch patterns while etch rate measurements will give evidence of the kinetics of the process. Monte Carlo calculations will be incorporated to help simulate the observed chemistry. This CAREER project will improve the computational skills of undergraduates and graduates through the implementation of a `Numerical Analysis for Chemists` course. Professor Hines will also improve students' readiness for the workforce through seminars in writing and public speaking skills. The study and development of new chemistries which can be applied to semiconductor processing systems continues to be a very vibrant area of research. Professor Hines and her students at Cornell University are combining physical measurement techniques and computational simulations to evaluate the use of a new family of aqueous, fluorine-based etchants. Previous studies have suggested that atomically flat silicon surfaces could be produced by these methods. This CAREER project holds the promise of producing results of substantial technological importance. Professor Hines will enhance the development of scientists with skills in the important area of computational chemistry through the introduction of a new undergraduate/graduate student course in that area. Technical writing and public speaking skills will be developed through topical seminars and coursework.

这个由分析和表面化学项目支持的教师早期职业发展（Career）项目侧重于蚀刻硅表面的详细微观、宏观和计算表征。特别是，将研究一类新的含水氟基蚀刻剂的使用。Hines教授和她在康奈尔大学的学生将使用扫描隧道显微镜来研究所得到的蚀刻图案的物理结构（质量），而蚀刻速率的测量将提供过程动力学的证据。蒙特卡罗计算将被纳入帮助模拟观察到的化学。这个职业项目将通过实施“化学家数值分析”课程来提高本科生和毕业生的计算技能。海恩斯教授还将通过写作和公开演讲技巧的研讨会，帮助学生为就业做好准备。可以应用于半导体处理系统的新化学物质的研究和开发仍然是一个非常活跃的研究领域。Hines教授和她在康奈尔大学的学生们正在将物理测量技术和计算模拟相结合，以评估一种新型水性氟基蚀刻剂的使用情况。先前的研究表明，原子平面硅表面可以通过这些方法产生。这个CAREER项目有望产生具有重大技术意义的成果。Hines教授将通过在计算化学这一重要领域开设一门新的本科生/研究生课程，加强对具有该领域技能的科学家的培养。技术写作和公开演讲技能将通过专题研讨会和课程来发展。