The Chemistry of Aqueous Si(100) Etchants: Site-Specific Surface Reactions and the Role of Stress

化学部的分析和表面化学（ASC）计划支持康奈尔大学化学系的Melissa Hines教授的研究项目。Hines教授和她的学生将建立在他们最近发现的各向异性蚀刻剂的基础上，该蚀刻剂产生具有近原子平坦形态的Si（100）表面，并继续开发新的反应和工艺，使表面形态的化学控制成为可能。他们将研究化学蚀刻的Si（100）表面和基本的化学机制，控制硅（100）表面形态的演变在水硅蚀刻使用红外吸收光谱，扫描隧道显微镜和动力学蒙特卡罗模拟的组合。该研究将为研究生和本科生提供与半导体行业高端应用直接相关的前沿研究领域的绝佳培训机会。

The Analytical and Surface Chemistry (ASC) program of the Division of Chemistry supports the research project of Prof. Melissa Hines of the Department of Chemistry at Cornell University. Prof. Hines and her students will build upon their recent discovery of an anisotropic etchant that produces Si(100)surfaces with near-atomically flat morphologies and continue to develop new reactions and processes that enable the chemical control of surface morphology. They will study chemically etched Si(100) surfaces and the fundamental chemical mechanisms that control the evolution of Si(100) surface morphology during aqueous silicon etching using a combination of infrared absorption spectroscopy, scanning tunneling microscopy, and kinetic Monte Carlo simulations. The study will provide excellent training opportunities to graduate and undergraduate students in a cutting edge research field with direct relevance to high end applications in the semiconductor industry.