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The Chemistry of Etching: Understanding Kinetic Surface Morphologies on an Atomic Scale

The Chemistry of Etching: Understanding Kinetic Surface Morphologies on an Atomic Scale
蚀刻化学:了解原子尺度上的动力学表面形态
批准号:
0138026
负责人:
Melissa Hines
金额:
$33.1万
依托单位:
依托单位国家:
美国
项目类别:
Continuing Grant
财政年份:
2002
资助国家:
美国
项目状态:
已结题
起止时间:
2002-06-01 至 2006-05-31

项目摘要

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中文摘要
翻译
该研究项目得到了分析和表面化学项目的支持,主要研究硅表面蚀刻的机理。 使用扫描探针显微镜和动力学Monte Carlo模拟方法的组合,Hines教授和她在康奈尔大学化学系的同事正在研究蚀刻条件对硅表面形态的影响。 实验正在解决用KOH溶液对Si(111)表面的水蚀刻,以及用于制造多孔硅材料的硅表面的阳极蚀刻。 步骤的方向,步骤的密度,和硅掺杂剂,以及蚀刻剂的成分和浓度的影响正在研究中。 这项工作的结果是重要的纳米材料技术的设计,以及电子材料加工策略的发展。关于化学蚀刻剂如何从硅晶片表面去除材料的信息对于制造微机电(MEMS)器件的工艺设计以及电子和光子器件的生产非常重要。 该研究项目的工作旨在了解硅的水和电化学蚀刻,其目标是对控制蚀刻表面的原子和纳米尺度形态的微观理解。 在分析和表面化学项目的支持下,Hines教授和她在康奈尔大学的同事们正在使用显微镜和计算机模拟相结合的方法来获得这些信息。
英文摘要
This research project, supported in the Analytical and Surface Chemistry Program, addresses the mechanism of etching of silicon surfaces. Using a combination of scanning probe microscopy and kinetic Monte Carlo simulation methods, Professor Hines and her colleagues in the Department of Chemistry at Cornell University are investigating the effect of etching conditions on the silicon surface morphology. Experiments are addressing the aqueous etching of the Si(111) surface by KOH solution, as well as the anodic etching of silicon surfaces used to create porous silicon materials. The effects of step orientation, step density, and silicon dopant, as well as etchant composition and concentration are being examined. Results of this work are important for the design of nanomaterial technologies, as well as for the development of electronic materials processing strategies. Information about how chemical etchants remove material from the surface of a silicon wafer is important for the design of processes to make micro-electromechanical (MEMS) devices, and for the production of electronic and photonic devices. The work of this research project is directed to developing an understanding of the aqueous and electrochemical etching of silicon, with the goal of developing a microscopic understanding of what controls the atomic and nano-scale morphology of the etched surface. With the support of the Analytical and Surface Chemistry Program, Professor Hines and her colleagues at Cornell, are using a combination of microscopy and computer simulation to obtain this information.
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CAS: Enhancing the Reactivity and Photoreactivity of Metal Oxide Surfaces through Fluorination
  • 批准号:
    2107716
  • 项目类别:
    Standard Grant
  • 资助金额:
    $48.0万
  • 财政年份:
    2021
  • 负责人:
    Melissa Hines
  • 依托单位:
SusChEM: Organic Linkages to Control and Enhance Titanium Dioxide Nanocatalysts
  • 批准号:
    1708025
  • 项目类别:
    Continuing Grant
  • 资助金额:
    $60.0万
  • 财政年份:
    2017
  • 负责人:
    Melissa Hines
  • 依托单位:
Understanding and controlling TiO2 reactivity with anisotropic surface chemistry
  • 批准号:
    1303998
  • 项目类别:
    Standard Grant
  • 资助金额:
    $42.0万
  • 财政年份:
    2013
  • 负责人:
    Melissa Hines
  • 依托单位:
The Chemistry of Aqueous Si(100) Etchants: Site-Specific Surface Reactions and the Role of Stress
  • 批准号:
    0911405
  • 项目类别:
    Continuing Grant
  • 资助金额:
    $46.25万
  • 财政年份:
    2009
  • 负责人:
    Melissa Hines
  • 依托单位:
海外基金