SBIR Phase I: Real-Time Sensing and Control for Physical Vapor Deposition (PVD) Processes in IC Manufacture

SBIR 第一阶段：IC 制造中物理气相沉积 (PVD) 工艺的实时传感和控制

• 批准号: 9761085
• 负责人: Fred Stanke
• 金额: $ 10万
• 依托单位: Sensys Instruments Corporation
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 1998
• 资助国家: 美国
• 起止时间: 1998-01-01 至 1998-06-30
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9761085&HistoricalAwards=false
• 关键词: SBIR; Phase; Real; Time; Sensing

Sensys Instruments Corp. will develop innovative acoustic sensor and model-based multivariable control technology to measure and control wafer temperature and film thickness in Physical Vapor Deposition (PVD) processes, a key technology used in semiconductor device wafer fabrication. There are currently no commercially available sensors that can provide real-time measurements of wafer temperature and thickness in PVD processes. This project will create an integrated package of sensor hardware, signal processing software and control software, adapted for PVD equipment.

Sensys Instruments Corp. 将开发创新的声学传感器和基于模型的多变量控制技术，以测量和控制物理气相沉积 (PVD) 工艺中的晶圆温度和薄膜厚度，这是半导体器件晶圆制造中使用的关键技术。 目前还没有商用传感器可以提供 PVD ​​工艺中晶圆温度和厚度的实时测量。 该项目将创建适用于 PVD ​​设备的传感器硬件、信号处理软件和控制软件的集成包。